申请人:SHOWA DENKO K.K.
公开号:EP2345676A1
公开(公告)日:2011-07-20
An object of the invention is to provide curable compositions for transfer materials suited for nanoimprinting processes, which compositions have high dry etching resistance against argon gas and high selectivity of dry etching rate between by argon gas and by oxygen gas, and can be fabricated into fine patterns used as resists or the like. A curable composition for transfer materials includes a (meth)acrylate compound having a triazine skeleton which is obtainable by reacting an aminotriazine compound, a compound having a hydroxyl group and a (meth) acryloyl group in the molecule, and an aldehyde.
本发明的目的是提供适用于纳米压印工艺的转印材料的可固化组合物,该组合物对氩气具有高抗干蚀刻性,对氩气和氧气的干蚀刻率具有高选择性,并可制成用作抗蚀剂等的精细图案。用于转印材料的可固化组合物包括一种具有三嗪骨架的(甲基)丙烯酸酯化合物,该化合物可通过氨基三嗪化合物、分子中具有羟基和(甲基)丙烯酰基的化合物以及醛的反应而获得。