4,4'-(1-Phenylethane-1,1-diyl)bis(2-tert-butylphenol) | 85914-48-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4,4'-(1-Phenylethane-1,1-diyl)bis(2-tert-butylphenol)
• 英文别名: 2-tert-butyl-4-[1-(3-tert-butyl-4-hydroxyphenyl)-1-phenylethyl]phenol
• CAS: 85914-48-3
• 化学式: C₂₈H₃₄O₂
• 分子量: 402.6
• InChiKey: OCEQSAGTCSHWKF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.5
• 重原子数：
  30
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  2-叔丁基苯酚 、 苯乙炔 以61%的产率得到
  参考文献：
  名称：

  RYABOV, V. D.;ZINOVEVA, L. V.;KOROBKOV, V. YU., ZH. PRIKL. XIMII, 1983, 56, N 2, 460-462

  摘要：

  DOI：

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• CURABLE RESIN COMPOSITION, CURABLE RESIN MOLDED BODY, CURED RESIN MOLDED BODY, METHOD FOR PRODUCING EACH OF SAME, AND LAMINATE BODY
  申请人：LINTEC CORPORATION

  公开号：US20140350187A1

  公开（公告）日：2014-11-27

  Provided is a curable resin composition comprising a thermoplastic resin (A) that includes a cyclic structure in its main chain, and has a glass transition temperature (Tg) of 140° C. or more, and a monofunctional curable monomer (B). The present invention provides: a cured resin formed article that has heat resistance and low birefringence, a method for producing the same, a curable resin composition and a curable resin formed article that are useful as a raw material for producing the cured resin formed article, and a laminate that includes a layer formed of a cured resin.

  提供的是一种可治愈树脂组合物，包括热塑性树脂（A），其主链中包含环状结构，并具有140℃或更高的玻璃化转变温度（Tg），以及单官能团可固化单体（B）。本发明提供了具有耐热性和低双折射率的固化树脂成型品，其生产方法，作为生产固化树脂成型品的原材料有用的可固化树脂组合物和可固化树脂成型品，以及包括由固化树脂形成的层的层压板。
• Vinylphenyl compound, process for the production thereof, polymerizable composition containing same, and crosslinked polymer formed therefrom
  申请人：TOKUYAMA SODA KABUSHIKI KAISHA

  公开号：EP0415729A2

  公开（公告）日：1991-03-06

  Novel vinylphenyl compound which gives, as a copolymer with other vinyl compound copolymerizable therewith, a crosslinked polymer excellent in birefringence, transparency, heat resistance and moisture absorption resistance. The crosslinked polymer is advantageously useful as a disk substrate.

  新颖的乙烯基苯基化合物，与其他可与之共聚的乙烯基化合物共聚后，可产生一种在双折射、透明度、耐热性和吸湿性方面都非常出色的交联聚合物。这种交联聚合物可用作磁盘衬底。
• HIGHLY HEAT-RESISTANT, HIGH-PURITY POLYARYLATE AND FILM PRODUCED FROM THE SAME
  申请人：UNITIKA LTD.

  公开号：EP0943640A1

  公开（公告）日：1999-09-22

  The present invention provides a polyarylate film comprising 9,9-bis(alkyl-4-hydroxyphenyl)fluorene residue and bisphenol residue with a molar ratio of the former of in the range of 0.05 to 1 in which the carboxylic acid component is composed of terephthalic acid residue and isophthalic acid residue, wherein the polyarylate film having good abrasion resistance and heat resistance, being highly transparent and having less incident-angle dependent birefringence can be obtained by solvent casting of a polyarylate solution with an inherent viscosity in the range of 0.25 to 2.50. The film has high abrasion resistance, heat resistance and purity along with being excellent in such optical characteristics as high transparency and low birefringence, which is applicable as molding materials for use in electric, electronic and optical fields and in automobile industry; as insulating materials in electric appliances, power generators, capacitors and interlayer insulators; and as surface coating films as dielectric films for use in transformers, wire coating and capacitors, and substrates for liquid crystal display panel.

  本发明提供了一种聚芳酸酯薄膜，该薄膜由9,9-双(烷基-4-羟基苯基)芴残基和双酚残基组成，前者的摩尔比在0.其中羧酸组分由对苯二甲酸残留物和间苯二甲酸残留物组成，通过溶剂浇铸固有粘度在 0.25 至 2.50 范围内的聚芳酸酯溶液，可获得耐磨性和耐热性良好、透明度高且随事件角而产生的双折射较小的聚芳酸酯薄膜。这种薄膜具有很高的耐磨性、耐热性和纯度，同时还具有高透明度和低双折射等优异的光学特性，可用作电气、电子和光学领域以及汽车工业中的成型材料；用作电器、发电机、电容器和层间绝缘体中的绝缘材料；以及用作变压器、电线涂层和电容器中的介质薄膜和液晶显示面板基板的表面涂层薄膜。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。