作者:R.J.P Corriu、G.F Lanneau、J.P Masse、D Samate
DOI:10.1016/s0022-328x(00)98064-1
日期:1977.3
Diphenylallylvinylsilane undergoes selective addition of n-butyllithium/TMEDA complex on the α-silyl double bond, while methyllithium/TMEDA affords the metallation of the allylic group, without modification of the vinyl group. From our results, metallation appeared highly selective. There is no formation of the dianion. These α-silylcarbanions are good precursors to linear or substituted silylalcohols
二苯基烯丙基乙烯基硅烷在α-甲硅烷基双键上进行正丁基锂/ TMEDA络合物的选择性加成,而甲基锂/ TMEDA提供了烯丙基的金属化,而没有乙烯基的改性。根据我们的结果,金属化表现出高度选择性。没有形成二价阴离子。这些α-甲硅烷基碳阴离子是线性或取代的甲硅烷基醇的良好前体。