Cobalt;nickel | 88411-82-9

• 分子结构分类: 无机化合物 - 均相金属化合物 - 均相过渡金属化合物
• 英文名称: Cobalt;nickel
• 英文别名: cobalt;nickel
• CAS: 88411-82-9
• 化学式: CoNi₅
• 分子量: 352.443
• InChiKey: ZHJQSIDTCIHGJF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.02
• 重原子数：
  6
• 可旋转键数：
  0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为产物：
  描述：

  cobalt(II) chloride 、 nickel dichloride 以 水 为溶剂， 生成 Cobalt;nickel
  参考文献：
  名称：

  Electrodeposition and characterisation of thin layers of NiCo alloys obtained from dilute chloride baths

  摘要：

  Electrodeposits of Ni, Co and five alloys were obtained by linear sweep voltammetry on vitreous carbon electrodes in dilute chloride baths. These coatings were analysed by linear sweep voltammetry in ammoniacal medium, scanning electron microscopy (SEM), EDX and dot-mapping techniques in relation to the final potential and the concentrations of metal ions in the bath. It was observed that the voltammetric results are consistent with solid solution characteristics, with the alloys exhibiting several chemical compositions depending on the Co content of the bath. These solid solutions yielded several voltammetric peaks during the dissolution scans, where it could be observed that the peak shape changed from that of pure Ni to pure Co. These aspects were also confirmed by SEM, where it was found that the surface morphologies changed in the same manner, from nodular (Ni) to fibrilar (Co) ones. Chemical analysis of the coatings by EDX revealed regular deposition behaviour, in contrast with that described in the literature (anomalous type). The regular behaviour was associated with the very thin deposits where the amount was not sufficient to promote anomalous behaviour. Dot-mapping demonstrated homogeneous distribution of Ni and Co atoms throughout the surface. (C) 2000 Elsevier Science Ltd. All rights reserved.

  DOI：

  10.1016/s0013-4686(99)00405-3

文献信息

• Electrodeposition and characterisation of thin layers of NiCo alloys obtained from dilute chloride baths
  作者：A.N Correia、S.A.S Machado

  DOI：10.1016/s0013-4686(99)00405-3

  日期：2000.2

  Electrodeposits of Ni, Co and five alloys were obtained by linear sweep voltammetry on vitreous carbon electrodes in dilute chloride baths. These coatings were analysed by linear sweep voltammetry in ammoniacal medium, scanning electron microscopy (SEM), EDX and dot-mapping techniques in relation to the final potential and the concentrations of metal ions in the bath. It was observed that the voltammetric results are consistent with solid solution characteristics, with the alloys exhibiting several chemical compositions depending on the Co content of the bath. These solid solutions yielded several voltammetric peaks during the dissolution scans, where it could be observed that the peak shape changed from that of pure Ni to pure Co. These aspects were also confirmed by SEM, where it was found that the surface morphologies changed in the same manner, from nodular (Ni) to fibrilar (Co) ones. Chemical analysis of the coatings by EDX revealed regular deposition behaviour, in contrast with that described in the literature (anomalous type). The regular behaviour was associated with the very thin deposits where the amount was not sufficient to promote anomalous behaviour. Dot-mapping demonstrated homogeneous distribution of Ni and Co atoms throughout the surface. (C) 2000 Elsevier Science Ltd. All rights reserved.