4,4',4''-Methanetriyltris[2,6-bis(methoxymethyl)phenol] | 877224-17-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4,4',4''-Methanetriyltris[2,6-bis(methoxymethyl)phenol]
• 英文别名: 4-[bis[4-hydroxy-3,5-bis(methoxymethyl)phenyl]methyl]-2,6-bis(methoxymethyl)phenol
• CAS: 877224-17-4
• 化学式: C₃₁H₄₀O₉
• 分子量: 556.6
• InChiKey: GENTZLNTHWIUKT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  40
• 可旋转键数：
  15
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  116
• 氢给体数：
  3
• 氢受体数：
  9

文献信息

• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。
• SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160200877A1

  公开（公告）日：2016-07-14

  The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1). There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate.

  本发明提供了一种含有硅骨架的聚合物化合物，其含有由通式（1）所示的重复单元。可以提供一种适用于化学增强负型光阻组合物的基础树脂的含有硅骨架的聚合物化合物，可以解决在金属布线（如Cu和Al）、电极和基板（特别是在SiN基板上）上产生的剥离问题，并且可以在图案底部和基板上不产生污点和足底轮廓的情况下形成细小的图案。
• SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160033865A1

  公开（公告）日：2016-02-04

  A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.

  提供一种硅结构承载聚合物，包括由双(4-羟基-3-烯丙基苯基)衍生物衍生的重复单元，并具有3,000-500,000的分子量。该聚合物用于化学增感负型光阻组成，克服了涂层从铜或铝的金属线路、电极和SiN基底剥离的问题。
• SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160097973A1

  公开（公告）日：2016-04-07

  The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.

  本发明提供了一种含有硅骨架的聚合物化合物，其包含由通式（1）所示的重复单元，并具有3,000至500,000的重均分子量。可以提供一种适用于化学增强负型光阻组合物的基础树脂的硅骨架聚合物化合物，该组合物可以纠正在金属线路（如Cu和Al）、电极和基板（尤其是在SiN基板上）上产生的剥离问题，并且可以在使用广泛使用的2.38％TMAH水溶液作为显影剂时，在图案底部和基板上不生成污染物和足型轮廓的情况下形成细小的图案。
• POLYAMIDE ACID AND RESIN COMPOSITION CONTAINING SAME
  申请人：Toray Industries, Inc.

  公开号：EP2832769A1

  公开（公告）日：2015-02-04

  The invention aims to provide polyamic acid that can form a varnish with a low viscosity and serves to produce, through curing, coat film with good mechanical characteristics and further aims to produce cured coat film with good mechanical characteristics regardless of whether the molar concentration of the acid anhydride group in the acid dianhydride monomer and that of the amino group in the multivalent amine compound or diamine compound are identical to or different from each other. This objective is met by polyamic acid including a structure as represented by chemical formula (1) given below: (In chemical formula (1), δ represents an oxygen or sulfur atom and W represents an electron-withdrawing group, and R11 and R12 represent independently a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms.

  本发明旨在提供可形成低粘度清漆的聚酰胺酸，通过固化可生产出具有良好机械特性的 涂膜，并进一步旨在生产出具有良好机械特性的固化涂膜，无论酸酐单体中酸酐基团的摩尔 浓度与多价胺化合物或二胺化合物中氨基的摩尔浓度是相同还是不同。包括如下化学式（1）所示结构的聚酰胺可以达到这一目的：(在化学式（1）中，δ 代表氧原子或硫原子，W 代表抽电子基团，R11 和 R12 分别独立地代表氢原子或具有 1 至 10 个碳原子的烃基。