4-[1,1-双(4-羟基苯基)丙基]苯酚 | 141888-09-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 中文名称: 4-[1,1-双(4-羟基苯基)丙基]苯酚
• 英文名称: 4-(1,1-di(4-hydroxyphenyl)propyl)phenol
• 英文别名: 4-[1,1-di(4-hydroxyphenyl)propyl]phenol；1,1,1-tris(4-hydroxyphenyl)-propane；4,4',4''-ethylidenetrisphenol；4,4',4''-(Propane-1,1,1-triyl)triphenol；4-[1,1-bis(4-hydroxyphenyl)propyl]phenol
• CAS: 141888-09-7
• 化学式: C₂₁H₂₀O₃
• 分子量: 320.388
• InChiKey: OLOKQMKXSWPVKZ-UHFFFAOYSA-N

物化性质

• 沸点：
  539.6±45.0 °C(Predicted)
• 密度：
  1.227±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.3
• 重原子数：
  24
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  双酚A 、 4-[1,1-双(4-羟基苯基)丙基]苯酚 、 聚合甲醛 、 4-叔丁基苯酚 生成 poly(2,2-bis(4-hydroxyphenyl)propane-co-p-t-butylphenol-co-4,4',4''-ethylidenetrisphenol-co-formaldehyde)
  参考文献：
  名称：

  摘要：

  DOI：

文献信息

• Novel material forming supramolecular structures, process and uses
  申请人：Hayes Wayne

  公开号：US20080200718A1

  公开（公告）日：2008-08-21

  The invention relates to novel material, forming supramolecular structures below its transition temperature, which contains at least one C=O and/or C=S group and at least one N—H, O—H and/or S—H group and wherein the material has the structure A(—X—B) n (1) wherein A is a cyclic, aromatic and/or aliphatic group, n being a number of 1 to 4, —X—B is, if n is 2, the same or different, and if n is 3 or 4, the same, partly the same or different and has one of the structures (2) to (4) NH—C(Y)—Y—B   (2) —NH—C(Y)—NR—B   (3) —Y—C(Y)—NR—B   (4) with Y being an Oxygen and/or Sulfur atom, B being an organic group with at least one heteroatom, where the heteroatom is bound to at least two carbon atoms when B is linear or cyclic, and where the heteroatom is bound to at least one carbon atom when B is branched, and R being a Hydrogen atom, a cyclic, aromatic and/or aliphatic group or another B group which is the same or different. The material can be made by reacting at least one isocyanate and/or thioisocyanate with at least one amine, alcohol and/or thiol. Typically, the material is used first below its transition temperature, followed by increasing the temperature to around or above the transition temperature, carrying out a process step and subsequently decrease the temperature below the transition temperature.

  该发明涉及一种新型材料，在其转变温度以下形成超分子结构，其含有至少一个C=O和/或C=S基团，以及至少一个N—H、O—H和/或S—H基团，并且该材料具有结构A(—X—B)n(1)，其中A是一个环状、芳香性和/或脂肪族基团，n为1至4的数字，—X—B是，如果n为2，则相同或不同，如果n为3或4，则相同、部分相同或不同，并且具有结构(2)到(4)之一NH—C(Y)—Y—B、—NH—C(Y)—NR—B、—Y—C(Y)—NR—B，其中Y是氧和/或硫原子，B是具有至少一个杂原子的有机基团，当B为线性或环状时，杂原子与至少两个碳原子结合，当B为支链时，杂原子与至少一个碳原子结合，R是氢原子、环状、芳香性和/或脂肪族基团，或另一个相同或不同的B基团。该材料可通过至少一种异氰酸酯和/或硫代异氰酸酯与至少一种胺、醇和/或硫醇反应制备。通常，该材料首先在其转变温度以下使用，随后升高温度至转变温度左右或以上，进行一个工艺步骤，然后降低温度至转变温度以下。
• POLYCARBONATE RESIN COMPOSITION AND FORMED PRODUCT THEREOF
  申请人：Monden Toshiki

  公开号：US20110245388A1

  公开（公告）日：2011-10-06

  In a polycarbonate resin composition containing a polycarbonate resin and a polycarbosilane compound, the use of the polycarbosilane compound modifies the surface properties of the polycarbonate resin composition without adversely affecting the intrinsic characteristics of the polycarbonate resin, such as transparency, heat resistance, and mechanical properties, e.g., impact resistance. A polycarbonate resin composition containing 100 parts by mass of a polycarbonate resin, 0.001 to 1 part by mass of a metal salt compound, and 0.005 to 5 parts by mass of a polycarbosilane compound has significantly improved flame resistance and high transparency and causes markedly reduced outgassing and mold fouling, without losing impact resistance and heat resistance.

  在含有聚碳酸酯树脂和聚碳硅烷化合物的聚碳酸酯树脂组合物中，使用聚碳硅烷化合物可以改变聚碳酸酯树脂组合物的表面特性，而不会对聚碳酸酯树脂的固有特性产生不利影响，如透明度、耐热性和机械性能（例如冲击强度）。含有100质量部聚碳酸酯树脂、0.001至1质量部金属盐化合物和0.005至5质量部聚碳硅烷化合物的聚碳酸酯树脂组合物具有显著提高的阻燃性和高透明度，显著减少气体排放和模具污染，同时不会损失冲击强度和耐热性。
• [EN] HIGH HEAT MONOMERS AND METHODS OF USE THEREOF<br/>[FR] MONOMÈRES À CHALEUR ÉLEVÉE ET LEURS PROCÉDÉS D'UTILISATION
  申请人：SABIC GLOBAL TECHNOLOGIES BV

  公开号：WO2016014536A1

  公开（公告）日：2016-01-28

  High purity epoxide compounds, methods for preparing the high purity epoxide compounds, and compositions derived from the epoxide compounds are provided. Also provided are materials and articles derived from the epoxide compounds.

  本发明提供了高纯度环氧化合物、制备高纯度环氧化合物的方法以及从环氧化合物衍生的组合物。还提供了从环氧化合物衍生的材料和物品。
• NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF
  申请人：Reddy Vummadi Venkat

  公开号：US20100081084A1

  公开（公告）日：2010-04-01

  The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.

  本发明提供了新型二氮基萘醌磺酸双酚衍生物。更具体地说，本发明涉及包括碱溶性树脂、光敏化合物和表面活性剂的光敏涂层。制备的光刻膜厚度小于1微米。光敏化合物在水性碱性溶液中可溶或可膨胀，是一般式（A）中的二氮基萘醌磺酸双酚酯，其中DNQ代表2-二氮基-1-萘醌-4-磺酰基、2-二氮基-1-萘醌-5-磺酰基、1-二氮基-2-萘醌-4-磺酰基基团，R1代表烷基、芳基和取代芳基基团。本发明还提供了一种涂覆和成像光敏组合物的方法。
• REACTIVE HOT MELT ADHESIVE
  申请人：Slark Andrew

  公开号：US20100152394A1

  公开（公告）日：2010-06-17

  Solvent free, moisture curable reactive hot melt adhesives are prepared using an oxazolidine functional prepolymer and a polyfunctional isocyanate.

  使用含有氧杂环功能预聚物和多官能异氰酸酯，制备无溶剂、湿度固化的反应热熔粘合剂。