Tris-methoxymethyl-isocyanurat | 23501-78-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 三嗪类
• 英文名称: Tris-methoxymethyl-isocyanurat
• 英文别名: 1,3,5-tris-methoxymethyl-[1,3,5]triazinane-2,4,6-trione；1,3,5-Tris(methoxymethyl)-1,3,5-triazinane-2,4,6-trione
• CAS: 23501-78-2
• 化学式: C₉H₁₅N₃O₆
• 分子量: 261.235
• InChiKey: OACFRAFZVCBNJA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.8
• 重原子数：
  18
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  88.6
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• Methods of forming patterns using compositions for an underlayer of photoresist
  申请人：Samsung Electronics Co., Ltd.

  公开号：US10712662B2

  公开（公告）日：2020-07-14

  A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.

  本发明公开了一种形成图案的方法。该方法包括制备一种组合物，该组合物包括溶剂和聚合物，聚合物包括重复单元，其中至少一个具有第一结构的异氰脲酸酯单元与另一个具有不同于第一结构的第二结构的异氰脲酸酯单元相连接；将组合物涂在基底上以形成底层；在底层上形成光刻胶层；蚀刻光刻胶层以形成光刻胶图案；以及使用光刻胶图案对基底进行图案化。
• PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME
  申请人：Lee Jae-Woo

  公开号：US20080305430A1

  公开（公告）日：2008-12-11

  Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C 2 ˜C 20 hydrocarbon group. The photoresist composition comprises 1˜85 weight % of a photo-sensitive compound represented by following Formula 1, 1˜55 weight % of a compound which reacts with a hydroxyl group (—OH) of the compound represented by Formula 1 to combine with the photo-sensitive compound represented by Formula 1; 1˜15 weight % of a photo-acid generator; and 12˜97 weight % of an organic solvent.
• METHODS OF FORMING PATTERNS USING COMPOSITIONS FOR AN UNDERLAYER OF PHOTORESIST
  申请人：Samsung Electronics Co., Ltd.

  公开号：US20170199459A1

  公开（公告）日：2017-07-13

  A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.
• US7273897B2
  申请人：——

  公开号：US7273897B2

  公开（公告）日：2007-09-25
• US7695893B2
  申请人：——

  公开号：US7695893B2

  公开（公告）日：2010-04-13