4-(1-(4-chlorophenyl)-1-(4-hydroxyphenyl)ethyl)phenol | 6607-38-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4-(1-(4-chlorophenyl)-1-(4-hydroxyphenyl)ethyl)phenol
• 英文别名: 2,2-Bis(4-hydroxy-phenyl)-2-(4-chloro-phenyl)-ethane；4-[1-(4-chlorophenyl)-1-(4-hydroxyphenyl)ethyl]phenol
• CAS: 6607-38-1
• 化学式: C₂₀H₁₇ClO₂
• 分子量: 324.807
• InChiKey: LUQVAGUAUJBWND-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  23
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

文献信息

• NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF
  申请人：Reddy Vummadi Venkat

  公开号：US20100081084A1

  公开（公告）日：2010-04-01

  The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.

  本发明提供了新型二氮基萘醌磺酸双酚衍生物。更具体地说，本发明涉及包括碱溶性树脂、光敏化合物和表面活性剂的光敏涂层。制备的光刻膜厚度小于1微米。光敏化合物在水性碱性溶液中可溶或可膨胀，是一般式（A）中的二氮基萘醌磺酸双酚酯，其中DNQ代表2-二氮基-1-萘醌-4-磺酰基、2-二氮基-1-萘醌-5-磺酰基、1-二氮基-2-萘醌-4-磺酰基基团，R1代表烷基、芳基和取代芳基基团。本发明还提供了一种涂覆和成像光敏组合物的方法。
• Antistatic polymer composition
  申请人：Ticona LLC

  公开号：US10287421B2

  公开（公告）日：2019-05-14

  A polymer composition having a reduced tendency to create a static electric charge during a molding operation is provided. More particularly, the composition contains an ionic liquid that is distributed within a polymer matrix that contains an aromatic polymer. In addition to being electrically conductive, the ionic liquid can exist in liquid form during melt processing, which allows it to be more uniformly blended within the aromatic polymer matrix. This improves electrical connectivity and thereby enhances the ability of the composition to rapidly dissipate static electric charges from its surface.

  本发明提供了一种聚合物组合物，该组合物在模塑操作过程中产生静电荷的趋势有所降低。更具体地说，这种组合物含有一种离子液体，分布在含有芳香族聚合物的聚合物基体中。除了具有导电性外，离子液体还能在熔融加工过程中以液态形式存在，从而更均匀地混合在芳香族聚合物基质中。这就提高了电气连接性，从而增强了组合物快速消散其表面静电荷的能力。
• Thermally conductive polymer composition
  申请人：Ticona LLC

  公开号：US10407605B2

  公开（公告）日：2019-09-10

  A polymer composition that has an in-plane thermal conductivity of about 2.0 W/m-K or more is provided. The composition comprises 100 parts by weight of at least one aromatic polymer; from about 10 to about 50 parts by weight of an inorganic material having a hardness value of about 2.5 or more based on the Mohs hardness scale; and from about 20 to about 80 parts by weight of a thermally conductive particulate material having an average size of from about 1 to about 100 micrometers.

  提供了一种面内热导率约为 2.0 W/m-K 或更高的聚合物组合物。该组合物包括 100 重量份的至少一种芳香族聚合物；约 10 至约 50 重量份的无机材料，其硬度值约为 2.5 或以上（基于莫氏硬度计）；以及约 20 至约 80 重量份的导热微粒材料，其平均粒径约为 1 至约 100 微米。
• Aromatic polymer composition for use in a camera module
  申请人：Ticona LLC

  公开号：US10829634B2

  公开（公告）日：2020-11-10

  A polymer composition that contains an aromatic polymer in combination with a tribological formulation is provided. The polymer composition may exhibit a low degree of surface friction that minimizes the extent to which a skin layer is peeled off during use of a part containing the composition (e.g., in a camera module). For example, the polymer composition may exhibit a dynamic coefficient of friction of about 1.0 or less and/or a wear depth may be about 500 micrometers or less as determined in accordance with VDA 230-206:2007.

  本文提供了一种含有芳香族聚合物的聚合物组合物，该组合物与摩擦学配方相结合。该聚合物组合物的表面摩擦力较小，可最大程度地减少含有该组合物的部件（如相机模组）在使用过程中表皮层脱落的程度。例如，根据 VDA 230-206:2007，聚合物组合物的动态摩擦系数约为 1.0 或更小，和/或磨损深度约为 500 微米或更小。
• NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF
  申请人：Council of Scientific & Industrial Research

  公开号：EP2137140B1

  公开（公告）日：2010-11-10