The present invention provides a photosensitive polyimide composition comprising a polyimide resin having a structural unit represented by the formula (1) and a structural unit represented by the formula (2), a quinonediazide sulfonate, a thermal curing agent, and a thermal acid generator.
In the formulas (1) and (2), n is an integer of 10 to 600, Ar1 is a tetravalent organic group; Ar2 is a divalent to tetravalent organic group; Ar3 is a divalent aromatic group; and R1 is an OH group or a COOH group. The present invention also provides a photoresist film made of the above-mentioned photosensitive polyimide composition.
本发明提供了一种光敏聚
酰亚胺组合物,该组合物由具有式(1)表示的结构单元和式(2)表示的结构单元的聚
酰亚胺树脂、醌
噻嗪磺酸盐、热固化剂和热酸发生器组成。
在式 (1) 和 (2) 中,n 是 10 至 600 的整数,Ar1 是四价有机基团;Ar2 是二价至四价有机基团;Ar3 是二价芳香基团;R1 是 OH 基团或 COOH 基团。本发明还提供了一种由上述光敏聚
酰亚胺组合物制成的光刻胶膜。