COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE
申请人:IWATO Kaoru
公开号:US20080161532A1
公开(公告)日:2008-07-03
A composition for forming a low-dielectric-constant film includes a compound represented by the following formula (A):
wherein each of Ar
1
and Ar
2
independently represents an aryl group that may have a substituent.