1H-phenalene;azide

• 分子结构分类: 有机化合物 - 苯类化合物 - 非那烯类
• 英文名称: 1H-phenalene;azide
• 化学式: C13H10N3-
• 分子量: 208.24
• InChiKey: NVJBCOOCPBUFOG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.28
• 重原子数：
  16
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Photosensitive gas generating agent and photocurable composition
  申请人：CANON KABUSHIKI KAISHA

  公开号：US10421853B2

  公开（公告）日：2019-09-24

  A photocurable composition excellent in the effect of reducing the mold releasing force even in a small amount of light exposure, and a photosensitive gas generating agent contained in the photocurable composition are provided. The photosensitive gas generating agent is a compound having a photostimulation responsive gas generating group to generate a gas by photostimulation, a perfluoroalkyl group and a polyalkyleneoxy group to link the photostimulation responsive gas generating group and the perfluoroalkyl group. The photocurable composition contains the photosensitive gas generating agent.

  本发明提供了一种即使在少量光照射下也能降低脱模力的效果极佳的光固化组合物，以及包含在光固化组合物中的光敏气体发生剂。 光敏气体发生剂是一种化合物，具有通过光刺激产生气体的光刺激响应气体发生基、全氟烷基和连接光刺激响应气体发生基和全氟烷基的聚亚烷氧基。光固化组合物含有光敏气体发生剂。
• EP2941781B1
  申请人：——

  公开号：EP2941781B1

  公开（公告）日：2017-08-09
• PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION
  申请人：Canon Kabushiki Kaisha

  公开号：EP2941781A1

  公开（公告）日：2015-11-11
• [EN] PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION<br/>[FR] AGENT DE GÉNÉRATION DE GAZ PHOTOSENSIBLE ET COMPOSITION PHOTODURCISSABLE
  申请人：CANON KK

  公开号：WO2014136977A1

  公开（公告）日：2014-09-12

  A photocurable composition excellent in the effect of reducing the mold releasing force even in a small amount of light exposure, and a photosensitive gas generating agent contained in the photocurable composition are provided. The photosensitive gas generating agent is a compound having a photostimulation responsive gas generating group to generate a gas by photostimulation, a perfluoroalkyl group and a polyalkyleneoxy group to link the photostimulation responsive gas generating group and the perfluoroalkyl group. The photocurable composition contains the photosensitive gas generating agent.