2,6-Diethyl-4-[2-[4-[1-[3-ethyl-4-hydroxy-5-(methoxymethyl)phenyl]-1-[4-hydroxy-3,5-bis(methoxymethyl)phenyl]ethyl]phenyl]propan-2-yl]phenol

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 2,6-Diethyl-4-[2-[4-[1-[3-ethyl-4-hydroxy-5-(methoxymethyl)phenyl]-1-[4-hydroxy-3,5-bis(methoxymethyl)phenyl]ethyl]phenyl]propan-2-yl]phenol
• 英文别名: 2,6-diethyl-4-[2-[4-[1-[3-ethyl-4-hydroxy-5-(methoxymethyl)phenyl]-1-[4-hydroxy-3,5-bis(methoxymethyl)phenyl]ethyl]phenyl]propan-2-yl]phenol
• 化学式: C₄₁H₅₂O₆
• 分子量: 640.8
• InChiKey: DKJROJHTWFYHON-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.9
• 重原子数：
  47
• 可旋转键数：
  14
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.41
• 拓扑面积：
  88.4
• 氢给体数：
  3
• 氢受体数：
  6

文献信息

• US20140272722A1
  申请人：——

  公开号：US20140272722A1

  公开（公告）日：2014-09-18
• COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD
  申请人：JSR CORPORATION

  公开号：US20150198882A9

  公开（公告）日：2015-07-16

  A composition for forming a resist underlayer film includes a polymer having a structural unit represented by a formula (1). Ar 1 , Ar 2 , Ar 3 and Ar 4 each independently represent a divalent aromatic hydrocarbon group or a divalent heteroaromatic group. A part or all of hydrogen atoms included in the divalent aromatic hydrocarbon group and the divalent heteroaromatic group represented by Ar 1 , Ar 2 , Ar 3 or Ar 4 may be substituted. R 1 represents a single bond or a divalent hydrocarbon group having 1 to 20 carbon atoms. A part or all of hydrogen atoms included in the divalent hydrocarbon group represented by R 1 may be substituted. The divalent hydrocarbon group represented by R 1 may have an ester group, an ether group or a carbonyl group in a structure thereof. Y represents a carbonyl group or a sulfonyl group. m is 0 or 1. n is 0 or 1.
• COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM, AND FORMING METHOD OF RESIST UNDERLAYER FILM, AND PATTERN-FORMING METHOD
  申请人：JSR CORPORATION

  公开号：US20150267046A1

  公开（公告）日：2015-09-24

  A composition for film formation includes a compound represented by formula (1), and a solvent. R 1 represents a monovalent group including an aromatic ring. n is an integer of 3 to 6. At least one monovalent group represented by R 1 further includes a group including an ethylenic double bond. a plurality of R 1 s are identical or different. A part or all of hydrogen atoms on the benzene ring in the formula (1) and on the aromatic ring are unsubstituted or substituted with a halogen atom or an alkyl group having 1 to 10 carbon atoms.
• COMPOSITION, METHOD FOR PRODUCING PATTERNED SUBSTRATE, FILM AND FORMING METHOD THEREOF, AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20160011512A1

  公开（公告）日：2016-01-14

  A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X 1 and X 2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X 1 or X 2 ; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.
• COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PATTERN-FORMING METHOD AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20160085152A1

  公开（公告）日：2016-03-24

  A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R 1 , R 2 and R 3 each independently represent a group represented by the formula (a). In the formula (a), R A represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. R B represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.