4,4'-methylene bis{2-[bis(2,5-dimethyl-4-hydroxyphenyl)methyl]phenol} | 231280-30-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4,4'-methylene bis{2-[bis(2,5-dimethyl-4-hydroxyphenyl)methyl]phenol}
• 英文别名: 4,4',4'',4'''-{Methylenebis[(6-hydroxy-3,1-phenylene)methanetriyl]}tetrakis(2,5-dimethylphenol)；4-[[5-[[3-[bis(4-hydroxy-2,5-dimethylphenyl)methyl]-4-hydroxyphenyl]methyl]-2-hydroxyphenyl]-(4-hydroxy-2,5-dimethylphenyl)methyl]-2,5-dimethylphenol
• CAS: 231280-30-1
• 化学式: C₄₇H₄₈O₆
• 分子量: 708.895
• InChiKey: KYUYNUHTQHRYGN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  11.4
• 重原子数：
  53
• 可旋转键数：
  8
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  121
• 氢给体数：
  6
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  4,4'-methylene bis{2-[bis(2,5-dimethyl-4-hydroxyphenyl)methyl]phenol} 、 二碳酸二叔丁酯 在 三乙胺 作用下， 以 4-甲基-2-戊酮 为溶剂， 反应 6.0h， 生成
  参考文献：
  名称：

  NOVEL POLYNUCLEAR POLYPHENOL COMPOUND

  摘要：

  一个多核多酚化合物由4,4'-亚甲基双酚结构作为主骨架构成，其中三苯基甲烷类型的三苯骨架通过亚甲基基团相互键合，其中与4,4'-亚甲基双酚中心骨架结合的两个羟基的反应性与分别与两个二苯基甲基取代基的四个苯基上的羟基的反应性显著不同。

  公开号：

  US20070232839A1
• 作为产物：
  描述：

  2,5-二甲基苯酚 、 5,5'-methylenebis(salicylaldehyde) 生成 4,4'-methylene bis{2-[bis(2,5-dimethyl-4-hydroxyphenyl)methyl]phenol}
  参考文献：
  名称：

  NOVEL POLYNUCLEAR POLYPHENOL COMPOUND

  摘要：

  一个多核多酚化合物由4,4'-亚甲基双酚结构作为主骨架构成，其中三苯基甲烷类型的三苯骨架通过亚甲基基团相互键合，其中与4,4'-亚甲基双酚中心骨架结合的两个羟基的反应性与分别与两个二苯基甲基取代基的四个苯基上的羟基的反应性显著不同。

  公开号：

  US20070232839A1

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME
  申请人：Merck Patent GmbH

  公开号：US20210181636A1

  公开（公告）日：2021-06-17

  The present invention provides a resist underlayer forming composition, which is well in heat resistance and gap filling. Further, the present invention provides methods of manufacturing a resist underlayer and semiconductor device using it. [Means for Solution] A composition comprising a allyloxy derivative having a specific group and a solvent, and methods of manufacturing a resist underlayer and semiconductor device using it.

  本发明提供了一种具有良好耐热性和填隙性的抗阻层形成组合物。此外，本发明还提供了使用该组合物制造抗阻层和半导体器件的方法。[解决方案手段] 包括具有特定基团的烯丙氧衍生物和溶剂的组合物，以及使用该组合物制造抗阻层和半导体器件的方法。
• CROSSLINKING AGENT, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING METHOD USING THE NEGATIVE RESIST COMPOSITION
  申请人：Okuyama Kenichi

  公开号：US20120115084A1

  公开（公告）日：2012-05-10

  Disclosed are a negative resist composition which shows excellent sensitivity and resolution in pattern formation by exposure to electron beams or EUV, a novel crosslinking agent suitable for the resist composition, and a pattern forming method using the resist composition. The negative resist composition comprises: (A) a polyphenol compound comprising two or more phenolic hydroxyl groups in a molecule thereof and having a molecular weight of 300 to 3,000, (B) an acid generator which directly or indirectly produces acid by exposure to active energy rays having a wavelength of 248 nm or less, and (C) a crosslinking agent represented by the following chemical formula (1). (The symbols shown in the formula (1) are defined in the Description).

  本发明涉及一种负型光阻组合物，通过暴露于电子束或极紫外线下表现出优异的感光性和分辨率，以及适用于该光阻组合物的新型交联剂和使用该光阻组合物的图案形成方法。该负型光阻组合物包括：（A）一种聚酚化合物，其分子中包含两个或更多酚羟基，并且分子量为300至3,000，（B）一种酸发生剂，通过暴露于波长为248nm或更短的活性能量射线而直接或间接产生酸，以及（C）一种由以下化学式（1）表示的交联剂。（化学式（1）中所示的符号在说明中有定义）。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
  申请人：INASAKI Takeshi

  公开号：US20130004888A1

  公开（公告）日：2013-01-03

  An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification).

  本发明的目的是提供一种光致或辐射致敏树脂组合物，该组合物可以形成具有高分辨率和优秀形状的独立线型图案，并显示出包括粗糙特性在内的优异的抗阻性能，以及提供使用该组合物的光致或辐射致敏膜和图案形成方法。光致或辐射致敏树脂组合物包含一种化合物（P），该化合物含有至少一个酚羟基和至少一个氢原子被代表如下通式（1）的基团取代的酚羟基的基团（式中各符号与权利要求书和说明书中的定义相同）。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。