通过X射线衍射和微探针分析研究了Ho-Ni-Ge系统在1070 K和高达60 at%Ho的情况下的情况。除了八种已知化合物外,HoNi 5 Ge 3(YNi 5 Si 3型),HoNi 2 Ge 2(CeAl 2 Ga 2型),Ho 2 NiGe 6(Ce 2 CuGe 6型),HoNiGe 3(SmNiGe 3)型),HoNi 0.2÷0.6 Ge 2(CeNiSi 2型),Ho 37÷34 Ni 6÷24 Ge 57÷42(AlB 2型),HoNiGe(TiNiSi型),Ho 3 NiGe 2(La 3 NiGe 2型),三元体系包含四个新化合物:Ho 3 Ni 11 Ge 4(Sc 3 Ni 11 Ge 4型),HoNi 3 Ge 2(ErNi 3 Ge 2型),Ho 3 Ni 2 Ge 3(Hf 3 Ni 2 Si 3型)和〜Ho 5 Ni 2 Ge 3(结构未知)。Ho 2 Ni
Factors influencing glass formation in rapidly solidified Si,Ge–Ni and Si,Ge–Ni–Nd alloys
作者:Dmitri V. Louzguine、Larissa V. Louzguina、Akihisa Inoue
DOI:10.1063/1.1457522
日期:2002.3.4
capabilities of binary Si,Ge–Ni and ternary Si,Ge–Ni–Ndalloys. The addition of Nd caused the formation of an amorphous single phase in the Ge–Ni–Ndalloy. The structure and crystallization behavior of the amorphous alloy were studied by differential scanning calorimetry and x-ray diffractometry. No amorphous phase formed in any of the Nd-free alloys or in the Si–Ni–Nd alloy. The higher glass-forming
Simultaneous growth of Ni5Ge3 and NiGe by reaction of Ni film with Ge
作者:F. Nemouchi、D. Mangelinck、C. Bergman、G. Clugnet、P. Gas、J. L. Lábár
DOI:10.1063/1.2358189
日期:2006.9.25
The reaction between nanometric Nifilms and Ge is analyzed using isothermal x-ray diffraction measurements and transmission electron microscopy. It is found that NiGe is formed during deposition at room temperature. The metal rich phase that grows during heat treatment has been clearly identified to be Ni5Ge3. The simultaneousgrowths of Ni5Ge3 and NiGe have been observed on amorphous and polycrystalline
使用等温 X 射线衍射测量和透射电子显微镜分析纳米 Ni 膜和 Ge 之间的反应。发现在室温下沉积期间形成NiGe。在热处理过程中生长的富金属相已被明确确定为 Ni5Ge3。在非晶和多晶锗上观察到 Ni5Ge3 和 NiGe 同时生长。这与薄膜中报道的通常顺序生长形成对比。
Pfisterer, H.; Schubert, K., Zeitschrift fur Metallkunde, 1950, vol. 41, p. 358 - 367
The incommensurately modulated , , solid solution: The ‘missing link’ between the NiP and MnP structure types
作者:A.-K. Larsson、F.J. García-García、R.L. Withers
DOI:10.1016/j.jssc.2007.01.006
日期:2007.3
The (3 + 1)-d incommensurately modulated structures of four members of the NiGe1-xPx solid solution field have been successfully refined from X-ray powder diffraction data (R-w(all)/R-wp = 2.13/3.92; 1,52/4.25; 1.27/3.44 and 2.00/4.03 for x = 0.4, 0.5, 0.6 and 0.7, respectively). The 4-d superspace group symmetry is Amam(00 gamma)s 0 0 (Z = 4; a = 5.0468(2), 5.0188(2), 4.9796(2) and 4.9651 (1) angstrom; b = 6.0636(3), 6.0576(2), 6.0183(2) and 6.0031(1) angstrom; c = 3.4877(2), 3.4812(2), 3.4593(1) and 3.45442(7) angstrom; gamma = 0.7769(2), 0.7467(1) 0.7241(1) and 0.7046(1) for x = 0.4, 0.5, 0.6 and 0.7, respectively). The underlying average structure is of NiAs type while the (in general) incommensurate primary modulation wave-vector, gamma c*, varies continuously and smoothly with composition. The two largest amplitude displacive atomic modulation functions (AMFs), for all samples, were the Ni displacement along b AMF and the Ge/P displacement along a AMF. The refined amplitude of the former was found to systematically increase with P content from 0.215 angstrom for NiGe0.6R0.4 to 0.294 angstrom for NiGe0.3R0.7 while the magnitude of the latter was found to increase with P content from 0.177 angstrom for NiGe0.6P0.4 to 0.253 angstrom for NiGe0.3P0.7. These displacive shifts significantly modulate the local crystal chemistry i.e. the local interatomic distances and co-ordination polyhedra. This continuously variable, incommensurately modulated, intermediate structure type is shown to provide a natural link or bridge between the two extreme end-member structures i.e. NiGe (of MnP structure type) and NiP by simply choosing the commensurate options with gamma = 1 and (1)/(2) respectively. (c) 2007 Elsevier Inc. All rights reserved.