COMPOSITION FOR BOTTOM REFLECTION PREVENTIVE FILM AND NOVEL POLYMERIC DYE FOR USE IN THE SAME
申请人:Clariant International Ltd.
公开号:EP1046958A1
公开(公告)日:2000-10-25
As a bottom anti-reflective coating material for use in photolithography, polymer dyes represented by following general formula are used. The polymer dyes are able to form a bottom anti-reflective coating having good film formation properties, good absorption properties at exposure wavelength, good step coverage, non-intermixing with photoresist and high etch rate.
wherein
R represents H or a substituted or non-substituted alkyl, cycloalkyl, or aryl group, R1 represents a substituted or non-substituted alkyl or aryl, or a -COOR3 group in which R3 represents an alkyl group, R2 represents a substituted or non-substituted alkyl, cycloalkyl, or aryl group, D is an organic chromophore which absorbs at the exposure wavelength (150-450 nm) and represents a substituted or non-substituted aryl, condensed aryl, or heteroaryl group, m and o are any integer above zero, and n, p and q are any integer including zero.
作为光刻技术中使用的底部抗反射涂层材料,可使用以下通式所代表的聚合物染料。这些聚合物染料能够形成具有良好成膜性能、曝光波长吸收性能、良好的阶跃覆盖、不与光刻胶互混和高蚀刻率的底部防反射涂层。
其中
R 代表 H 或取代或非取代的烷基、环烷基或芳基;R1 代表取代或非取代的烷基或芳基,或其中 R3 代表烷基的 -COOR3 基团;R2 代表取代或非取代的烷基、环烷基或芳基;D 代表取代或非取代的烷基、环烷基或芳基、D 是有机发色团,可在曝光波长(150-450 纳米)处吸收,代表取代或非取代的芳基、缩合芳基或杂芳基,m 和 o 是零以上的任意整数,n、p 和 q 是包括零在内的任意整数。