中文名称 | 英文名称 | CAS号 | 化学式 | 分子量 |
---|---|---|---|---|
[双(三氟乙酰氧基)碘]苯 | bis-[(trifluoroacetoxy)iodo]benzene | 2712-78-9 | C10H5F6IO4 | 430.042 |
Chemical vapor deposition (CVD) is an attractive method for producing bulk and thin-film materials for a variety of applications. In this method, gaseous reagents condense onto a substrate and then react to produce solid materials. The materials produced by CVD are theoretically dense, highly pure, and have other superior properties.