2-(1,4-oxathiane-2-yloxy)-2-oxoethyl methacrylate | 1184870-34-5

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧硫烷类
• 英文名称: 2-(1,4-oxathiane-2-yloxy)-2-oxoethyl methacrylate
• 英文别名: [2-(1,4-Oxathian-2-yloxy)-2-oxoethyl] 2-methylprop-2-enoate
• CAS: 1184870-34-5
• 化学式: C₁₀H₁₄O₅S
• 分子量: 246.284
• InChiKey: NKTCQHLEIMYYLD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  16
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  87.1
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  甲基丙烯酸 、 1,4-oxathiane-2-yl chloroacetate 在 potassium carbonate 、 4-甲氧基苯酚 、 四丁基碘化铵 作用下， 以 甲苯 为溶剂， 反应 3.5h， 以83.3%的产率得到2-(1,4-oxathiane-2-yloxy)-2-oxoethyl methacrylate
  参考文献：
  名称：

  (Meth)acrylate derivative, intermediate thereof, and polymer compound

  摘要：

  提供一种聚合物化合物，如下所示，可用作具有较少膨胀的聚合物的原材料，通过聚合含有上述聚合物化合物的原材料得到的聚合物，包含上述聚合物并在LWR方面改进的光阻组合物，以及上述聚合物化合物的高效生产工艺：其中n表示0到2的整数；R1表示氢原子、甲基或三氟甲基；R2、R3、R4、R5、R6、R7、R8、R9和R10表示氢原子、具有1到6个碳原子的烷基或类似物；W表示具有1到10个碳原子的烷基或类似物；Y1和Y2表示氧原子或硫原子。

  公开号：

  US08492562B2

文献信息

• COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20120295201A1

  公开（公告）日：2012-11-22

  A compound represented by formula (I): wherein T 1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L 1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L 2 and L 3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W 1 and ring W 2 each independently represent a C3-C36 hydrocarbon ring, R 1 and R 2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R 3 and R 4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R 5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.

  一个由化学式(I)表示的化合物：其中T1代表一个单键或一个C6-C14芳香烃基，L1代表一个C1-C17二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，L2和L3分别独立地代表一个单键或一个C1-C6二价饱和碳氢基团，其中一个亚甲基基团可以被氧原子或羰基所取代，环W1和环W2分别独立地代表一个C3-C36碳氢环，R1和R2分别独立地代表一个氢原子、一个羟基或一个C1-C6烷基基团，R3和R4分别独立地代表一个羟基或一个C1-C6烷基基团，R5代表一个羟基或一个甲基基团，m代表0或1，t和u分别独立地代表0到2之间的整数。
• Oxime Compound and Resist Composition Containing the Same
  申请人：MASUYAMA Tatsuro

  公开号：US20100021847A1

  公开（公告）日：2010-01-28

  An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R 1 ) represents a C1-C30 aliphatic hydrocarbon group etc., R 2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q 1 and Q 2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.
• (METH)ACRYLATE DERIVATIVE, INTERMEDIATE THEREOF, AND POLYMER COMPOUND
  申请人：Sato Junko

  公开号：US20100331508A1

  公开（公告）日：2010-12-30

  Provided are a polymerizable compound shown below which is useful as a raw material for a polymer having less swelling in developing, a polymer obtained by polymerizing a raw material containing the above polymerizable compound, a photoresist composition which contains the above polymer and which is improved in LWR and an efficient production process for the polymerizable compound described above: wherein n represents an integer of 0 to 2; R 1 represents a hydrogen atom, methyl or trifluoromethyl; R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 10 represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or the like; W represents an alkylene group having 1 to 10 carbon atoms or the like; and Y 1 and Y 2 represent an oxygen atom or a sulfur atom.
• RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：Ichikawa Koji

  公开号：US20110053082A1

  公开（公告）日：2011-03-03

  A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that optionally has one or more halogen atoms; X 1 represents a C 2 to C 36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C 1 to C 24 hydrocarbon group, a C 1 to C 12 alkoxyl group, a C 2 to C 4 acyl group, or a C 2 to C 4 acyloxy group, and one or more —CH 2 — contained in the heterocyclic group may be replaced by —CO— or —O—.
• PHOTORESIST COMPOSITION
  申请人：MASUYAMA Tatsuro

  公开号：US20110200935A1

  公开（公告）日：2011-08-18

  The present invention provides a photoresist composition having a sulfonium salt comprising an anion represented by the formula (IA): wherein R 1 and R 2 independently represent a hydrogen atom, a C1-C12 aliphatic hydrocarbon group, a C3-C20 saturated cyclic hydrocarbon group, a C6-C20 aromatic hydrocarbon group or a C7-C21 aralkyl group, and the aliphatic hydrocarbon group, the saturated cyclic hydrocarbon group, the aromatic hydrocarbon group and the aralkyl group can have one or more substituents selected from the group consisting of a hydroxyl group, a cyano group, a fluorine atom, a trifluoromethyl group and a nitro group, and one or more —CH 2 — in the aliphatic hydrocarbon group can be replaced by —O— or —CO—, or R 1 and R 2 are bonded each other to form a C4-C20 nitrogen-containing ring together with the nitrogen atom to which they are bonded, an acrylic resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.