2-(2-Ethoxyethylsulfanyl)dibenzo-p-dioxin

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并二恶英
• 英文名称: 2-(2-Ethoxyethylsulfanyl)dibenzo-p-dioxin
• 英文别名: 2-(2-ethoxyethylsulfanyl)dibenzo-p-dioxin
• 化学式: C₁₆H₁₆O₃S
• 分子量: 288.4
• InChiKey: GHKFXQHGDWDJAC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  20
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  53
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, AND COMPOUND<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AU RAYONNEMENT ACTINIQUE, FILM DE PHOTORÉSINE UTILISANT UNE TELLE COMPOSITION, PROCÉDÉ DE FORMATION DE MOTIFS, ET PROCÉDÉ POUR LA FABRICATION DE DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE, ET COMPOSÉ
  申请人：FUJIFILM CORP

  公开号：WO2014034533A1

  公开（公告）日：2014-03-06

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by Formula (1): wherein R1 represents a polycyclic aromatic group or a polycyclic heterocyclic aromatic group, R2 represents a (n+2)-valent saturated hydrocarbon group, R3 represents a (m+2)-valent saturated hydrocarbon group, R4 and R5 each independently represent a substituent, Q represents a linking group containing a heteroatom, m and n each independently represent an integer of 0 to 12, when n is 2 or more, R4's may be the same or different, R4's may be linked to each other to form a non-aromatic ring together with R2, when m is 2 or more, R5's may be the same or different, and R5's may be linked to each other to form a non-aromatic ring together with R3, and X- represents a non-nucleophilic anion.