phosphoric acid ethyl ester hexadecyl ester | 29690-03-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磷酸及其衍生物
• 英文名称: phosphoric acid ethyl ester hexadecyl ester
• 英文别名: ethyl hexadecyl phosphate；n-Hexadecyl-aethylhydrogenphosphat；Ethyl-n-hexadecylhydrogenphosphat；Ethyl hexadecyl hydrogen phosphate
• CAS: 29690-03-7
• 化学式: C₁₈H₃₉O₄P
• 分子量: 350.479
• InChiKey: VSFIAFGIXSTWTL-UHFFFAOYSA-N

物化性质

• 沸点：
  430.0±28.0 °C(Predicted)
• 密度：
  0.973±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  7.1
• 重原子数：
  23
• 可旋转键数：
  18
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  55.8
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  1-十六烷醇 在 sodium hypochlorite 、 lithium methanolate 、 sodium hydroxide 作用下， 以 甲醇 为溶剂， 生成 phosphoric acid ethyl ester hexadecyl ester
  参考文献：
  名称：

  GELLED HYDROCARBONS FOR OILFIELD PROCESSES, PHOSPHATE ESTER COMPOUNDS USEFUL IN GELLATION OF HYDROCARBONS AND METHODS FOR PRODUCTION AND USE THEREOF

  摘要：

  磷酸酯与金属源结合在一起用于凝胶化烃类物质，并公开了磷酸酯的制备方法。石油精炼塔中的结垢被归因于用于凝胶化油井压裂的磷酸酯中存在的杂质的蒸馏。改进的磷酸酯制备方法导致产品大幅减少或消除挥发性磷，即在250°C以下蒸馏的磷杂质，并增加使用磷酸酯形成的烃类凝胶的高温粘度。

  公开号：

  US20110046408A1

文献信息

• A New Phosphorylating Reagent. III. Preparation of Mixed Diesters of Phosphoric Acid by the Use of an Activatable Protecting Group
  作者：Yoshitaka Mushika、Tsujiaki Hata、Teruaki Mukaiyama

  DOI：10.1246/bcsj.44.232

  日期：1971.1

  A novel method for the preparation of mixed diesters of phosphoric acid has been investigated. It was found that mixed diesters of phosphoric acid were prepared by the reaction of alkyl 2-chloromethyl-4-nitrophenyl hydrogen phosphates with alcohols in dry pyridine. On the other hand, these diesters were also obtained from dialkyl 2-chloromethyl-4-nitrophenyl phosphates on hydrolysis under mild conditions

  研究了一种制备混合磷酸二酯的新方法。发现混合磷酸二酯是通过烷基 2-氯甲基-4-硝基苯基磷酸氢盐与醇在无水吡啶中反应制备的。另一方面，这些二酯也由二烷基 2-氯甲基-4-硝基苯基磷酸酯在温和条件下水解获得。通过使用这两种方法，可以高收率获得分析纯的磷酸混合二酯样品。
• Semiconductor device and method of manufacture
  申请人：Taiwan Semiconductor Manufacturing Company, Ltd.

  公开号：US11309190B2

  公开（公告）日：2022-04-19

  In a wet etching process to pattern a metal layer such as a p-metal work function layer over a dielectric layer such as a high-k gate dielectric layer, a selectivity of the wet etching solution between the metal layer and the dielectric layer is increased utilizing an inhibitor. The inhibitor includes such inhibitors as a phosphoric acid, a carboxylic acid, an amino acid, or a hydroxyl group.

  在将金属层（如 p-金属工作函数层）图案化到介电层（如高 K 栅极介电层）上的湿蚀刻工艺中，利用抑制剂可提高湿蚀刻溶液在金属层和介电层之间的选择性。抑制剂包括磷酸、羧酸、氨基酸或羟基等抑制剂。
• PHOTOGRAPHIC ELEMENT CONTAINING THIN TRANSPARENT MAGNETIC RECORDING LAYER AND METHOD FOR THE PREPARATION THEREOF
  申请人：EASTMAN KODAK COMPANY

  公开号：EP0513169A1

  公开（公告）日：1992-11-19
• MAGNETIC PARTICLES
  申请人：EASTMAN KODAK COMPANY

  公开号：EP0556318A1

  公开（公告）日：1993-08-25
• Semiconductor Device and Method of Manufacture
  申请人：Taiwan Semiconductor Manufacturing Company, Ltd.

  公开号：US20210225660A1

  公开（公告）日：2021-07-22

  In a wet etching process to pattern a metal layer such as a p-metal work function layer over a dielectric layer such as a high-k gate dielectric layer, a selectivity of the wet etching solution between the metal layer and the dielectric layer is increased utilizing an inhibitor. The inhibitor includes such inhibitors as a phosphoric acid, a carboxylic acid, an amino acid, or a hydroxyl group.