A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1):
A
n
SiX
(4-n)
(1)
wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.
形成绝缘膜的组合物,包括下列化合物中的至少一种:由式(1)表示的化合物、由式(1)表示的化合物的
水解物和由式(1)表示的化合物的缩聚物:AnSiX(4-n)(1)其中n表示1至3的整数;A表示含有由11个或更多碳原子形成的笼状结构的可选择取代基,当n表示2或3的整数时,A可以相同也可以不同;X表示可
水解基团,当n表示1或2的整数时,X可以相同也可以不同。