argon fluoride | 56617-31-3

• 分子结构分类: 无机化合物 - 均质非金属化合物 - 均质惰性气体
• 英文名称: argon fluoride
• 英文别名: _Argonfluoride；argon-fluoride；fluoroargon
• CAS: 56617-31-3
• 化学式: ArF
• 分子量: 58.9464
• InChiKey: MYZJHMVPKNFDFP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.42
• 重原子数：
  2.0
• 可旋转键数：
  0.0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0.0
• 氢给体数：
  0.0
• 氢受体数：
  0.0

反应信息

• 作为产物：
  描述：

  氩 在 fluorine 作用下， 生成 argon fluoride
  参考文献：
  名称：

  Comparison of the Ar(³P₂) and Ar(³P₀) reactions with chlorine and fluorine containing molecules: Propensity for ion–core conservation

  摘要：

  Optical pumping has been used to select Ar atoms in the metastable 3P2 or 3P0 state in a flowing afterglow reactor. The relative concentrations of the two metastable states were assigned from observation of the N2(C,v′) emission spectra. The isolated reactions of the Ar(3P2) and Ar(3P0) atoms with F2, NF3, Cl2, CCl4, PCl3, and SOCl2 were examined at 300 K by observation of ArCl* and ArF* formation. The total quenching rate constants for Ar(3P0) are slightly larger than for Ar(3P2). The Ar(3P2) atom reactions give only the B and C states of ArF* and ArCl*; the Ar(3P0) atom reactions give a mixture of B, C, and D states with B and D being favored. Thus, a propensity for conservation of the Ar+ ion–core configuration was found. The branching fraction for ArX* formation from Ar(3P0) with Cl2, SOCl2, F2, NF3 are similar, but those for PCl3 and CCl4 are smaller, relative to Ar(3P2). Improved rate constants for formation of individual N2(C,v′) levels from Ar(3P0) and (3P2) reacting with N2 at 300 K are given in the Appendix.

  DOI：

  10.1063/1.456691

文献信息

• ArF*, KrF* and XeF* emissions produced from dissociative ion recombination reactions of Ar+, Kr+ and Xe+ with SF6− in the flowing afterglow
  作者：Masaharu Tsuji、Makoto Furusawa、Yukio Nishimura

  DOI：10.1016/0009-2614(90)85044-d

  日期：1990.3

  The ArF*, KrF*, and XeF* emissions resulting from dissociative ion recombination between rare gas cations and SF6− anions have been studied in the flowing afterglow. The anions were formed by thermal electron capture by SF6. The KrF* product state distribution from the two Kr+(2P32,12) spin-orbit states showed that the B and C states are preferentially formed by the Kr+(2P32) reaction, while Kr+(2P12)

  使用ArF *，KrF受*和氟化氙*从稀有气体阳离子和SF之间的解离离子重组产生的排放6 -阴离子已经研究在流动余辉。通过SF 6的热电子俘获形成阴离子。来自两个Kr +（2 P 32,12）自旋轨道状态的KrF *产物状态分布表明B和C状态优先由Kr +（2 P 32）反应形成，而Kr +（2 P 12）有利于D状态的形成。可以通过考虑势能图来解释状态选择性。
• Kinetic studies of Ar₂F* in electron‐beam excited Ar–NF₃ mixtures
  作者：N. Boewering、R. Sauerbrey、H. Langhoff

  DOI：10.1063/1.443453

  日期：1982.4

  The fluorescence of ArF* and Ar2F* produced in e-beam exited mixtures of Ar, NF3, and He was investigated. Ar2F* is mainly generated via ArF* by ionic channels and by Ar*2. However, also the direct production from Ar*2 was observed. Rate constants for the production and quenching of Ar2F* are deduced from the measurements. Due to the long exciting pulse of 45 ns, the fluorescence efficiency became rather low and was determined to be 0.1 Ar2F* photons/excited argon atom at optimum conditions.
• Comparison of the Ar(³<i>P</i>₂) and Ar(³<i>P</i>₀) reactions with chlorine and fluorine containing molecules: Propensity for ion–core conservation
  作者：N. Sadeghi、M. Cheaib、D. W. Setser

  DOI：10.1063/1.456691

  日期：1989.1

  Optical pumping has been used to select Ar atoms in the metastable 3P2 or 3P0 state in a flowing afterglow reactor. The relative concentrations of the two metastable states were assigned from observation of the N2(C,v′) emission spectra. The isolated reactions of the Ar(3P2) and Ar(3P0) atoms with F2, NF3, Cl2, CCl4, PCl3, and SOCl2 were examined at 300 K by observation of ArCl* and ArF* formation. The total quenching rate constants for Ar(3P0) are slightly larger than for Ar(3P2). The Ar(3P2) atom reactions give only the B and C states of ArF* and ArCl*; the Ar(3P0) atom reactions give a mixture of B, C, and D states with B and D being favored. Thus, a propensity for conservation of the Ar+ ion–core configuration was found. The branching fraction for ArX* formation from Ar(3P0) with Cl2, SOCl2, F2, NF3 are similar, but those for PCl3 and CCl4 are smaller, relative to Ar(3P2). Improved rate constants for formation of individual N2(C,v′) levels from Ar(3P0) and (3P2) reacting with N2 at 300 K are given in the Appendix.