N-acryloylthiomorpholine | 97842-87-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 噻嗪类
• 英文名称: N-acryloylthiomorpholine
• 英文别名: 4-acryloylthiomorpholine；1-thiomorpholinoprop-2-en-1-one；4-Acryloyl-thiomorpholin；1-thiomorpholin-4-ylprop-2-en-1-one
• CAS: 97842-87-0
• 化学式: C₇H₁₁NOS
• 分子量: 157.236
• InChiKey: LYGXUCWNFYFFBS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  45.6
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  N-acryloylthiomorpholine 、 1,3-dioxo-2,3-dihydro-1H-isoindol-2-yl 2-methyl-2-phenoxypropanoate 在 N,N-二甲基乙酰胺 、 eosin Y disodium salt 作用下， 反应 12.0h， 以35%的产率得到(2,2-dimethyl-3,4-dihydrochromen-4-yl)-thiomorpholin-4-ylmethanone
  参考文献：
  名称：

  选择性自由基级联 (4+2) 环化与烯烃通过有机光氧化还原催化合成色满衍生物

  摘要：

  由于色满框架在药物化学中的重要性，为这些结构开发新的合成方法越来越引起化学家的兴趣。这里报道了一种新的 (4 + 2) 自由基环化方法，用于通过光催化构建这些功能性六元框架。该协议具有温和的反应条件，可随时获得N-羟基邻苯二甲酰亚胺酯和缺电子烯烃以高选择性方式转化为各种有价值的色满。此外，本策略可用于天然产物衍生物和生物活性化合物的后期功能化，显示出潜在的应用。该方法是对邻醌甲基化物和富电子亲双烯体的传统 Diels-Alder [4 + 2] 环加成反应的补充，因为缺电子亲双烯体顺利转化为所需的色满。

  DOI：

  10.1039/d2sc00903j
• 作为产物：
  描述：

  硫代吗啉 、 丙烯酰氯 在 potassium carbonate 作用下， 反应 3.0h， 以42%的产率得到N-acryloylthiomorpholine
  参考文献：
  名称：

  Photopolymer composition for holographic recording

  摘要：

  提供的是一种光敏聚合物组合物，可能在全息记录过程中表现出低体积收缩，并且可能防止光敏染料在全息记录后仍未漂白。

  公开号：

  US09874811B2

文献信息

• ULTRAVIOLET ABSORBING POLYMER, CELLULOSE ESTER OPTICAL FILM, METHOD OF PRODUCING CELLULOSE ESTER OPTICAL FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY
  申请人：Suzuki Takayuki

  公开号：US20100104775A1

  公开（公告）日：2010-04-29

  Disclosed is an ultraviolet absorbing polymer which is characterized by being derived from an ethylenically unsaturated monomer having a partial structure represented by Formula (A) below in a molecule, and a monomer represented by Formula (B) below:

  本发明涉及一种紫外线吸收聚合物，其特征在于其由分子中具有以下式(A)所表示的部分结构的乙烯基不饱和单体和以下式(B)所表示的单体衍生而来：
• Graft copolymer and process for producing the same
  申请人：IDEMITSU KOSAN COMPANY LIMITED

  公开号：EP0490269A1

  公开（公告）日：1992-06-17

  There is provided a process for producing a styrenic graft copolymer which comprises coplymerizing a styrenic monomer and a styrenic monomer having a hydrocarbon radical with an unsaturated bond in the presence of a catalyst comprising as primary ingredient (A) a transition metal compound and (B) a contact product of an organoaluminum compound and a condensation agent or (C) a compound which produces an ionic complex by reacting with the above-mentioned transition metal compound and subsequently graft polymerizing an ethylenically unsaturated monomer onto the resultant styrenic copolymer. The above-described styrenic graft copolymer is greatly improved in terms of compatibility, adhesivity, coatability and wettability while preserving heat resistance and chemical resistance thereof, and thus effective as a variety of constructional materials and compatibilizing agents. Furthermore, the composition or multi-layer material comprising the above-mentioned styrenic graft copolymer is widely utilized in a variety of application field including film, sheet, especially stampable sheet, container, packaging material, automobile parts, electrical and electronic parts, etc.

  提供了一种生产苯乙烯接枝共聚物的工艺，该工艺包括在催化剂存在下，使苯乙烯单体和具有不饱和键烃基的苯乙烯单体共聚，催化剂的主要成分包括(A)过渡金属化合物和(B)有机铝化合物与缩合剂的接触产物或(C)通过与上述过渡金属化合物反应产生离子络合物的化合物，然后将乙烯基不饱和单体接枝聚合到生成的苯乙烯共聚物上。上述过渡金属化合物反应生成离子络合物的化合物，然后将乙烯不饱和单体接枝聚合到生成的苯乙烯共聚物上。 上述苯乙烯接枝共聚物在保持其耐热性和耐化学性的同时，在相容性、粘合性、涂覆性和润湿性方面得到了极大的改善，因此可以有效地用作各种建筑材料和相容剂。此外，由上述苯乙烯接枝共聚物组成的组合物或多层材料可广泛应用于各种应用领域，包括薄膜、片材，尤其是可冲压片材、容器、包装材料、汽车零件、电子电气零件等。
• POLISHING AGENT FOR SILICON OXIDE, LIQUID ADDITIVE, AND METHOD OF POLISHING
  申请人：Hitachi Chemical Co., Ltd.

  公开号：EP1956642A1

  公开（公告）日：2008-08-13

  The polishing slurry of the invention is a polishing slurry for polishing a silicon oxide film on polysilicon, which contains an abrasive, polysilicon polishing inhibitor, and water. As the polishing inhibitor, it is preferable to use (1) a water-soluble polymer having a N-monosubstituted or N,N-disubstituted skeleton substituted by any member selected from the group consisting of acrylamide, methacrylamide, and α-substitutedderivatives thereof, (2) polyethylene glycol, (3) an oxyethylene adduct of an acetylene-based diol, (4) a water-soluble organic compound having an acetylene bond, (5) an alkoxylated linear aliphatic alcohol, or (6) a copolymer containing polyvinyl pyrrolidone or vinyl pyrrolidone. There is provided a polishing method which is capable of polishing a silicon oxide film on a polysilicon film at a high speed, and inhibiting the progress of polishing of a polysilicon film in exposed parts in the manufacturing method for a semiconductor.

  本发明的抛光浆料是一种用于抛光多晶硅上的氧化硅膜的抛光浆料，它含有研磨剂、多晶硅抛光抑制剂和水。作为抛光抑制剂，最好使用 (1) 具有被选自丙烯酰胺、甲基丙烯酰胺及其 α-取代衍生物的任一成员取代的 N-单取代或 N,N-二取代骨架的水溶性聚合物、(2) 聚乙二醇；(3) 乙炔基二醇的氧乙烯加合物；(4) 具有乙炔键的水溶性有机化合物；(5) 烷氧基化线性脂肪醇；或 (6) 含有聚乙烯基吡咯烷酮或乙烯基吡咯烷酮的共聚物。本发明提供了一种抛光方法，它能够高速抛光多晶硅薄膜上的氧化硅薄膜，并能抑制半导体制造方法中暴露部分多晶硅薄膜的抛光进程。
• Polishing slurry for silicon oxide, additive liquid and polishing method
  申请人：Hitachi Chemical Co., Ltd.

  公开号：EP2410558A2

  公开（公告）日：2012-01-25

  The present invention concerns the use of a polishing slurry in a method of polishing a silicon oxide film on polysilicon, wherein the polishing slurry contains an abrasive, a polysilicon polishing inhibitor, and water, wherein the polysilicon polishing inhibitor is either an oxyethylene adduct of an acetylene-based diol or the compound represented by the following general formula (III):         R1-C=C-R2     (III) (in the general formula (III), R1 represents a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms, R2 represents a substituted or unsubstituted alkyl group having 4 to 10 carbon atoms).

  本发明涉及在抛光多晶硅上的氧化硅膜的方法中使用抛光浆料，其中抛光浆料包含磨料、多晶硅抛光抑制剂和水，其中多晶硅抛光抑制剂是乙炔基二元醇的氧乙烯加合物或以下通式(III)代表的化合物： R1-C=C-R2 (III) (在通式（III）中，R1 代表氢原子或具有 1 至 5 个碳原子的取代或未取代的烷基，R2 代表具有 4 至 10 个碳原子的取代或未取代的烷基）。
• POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE
  申请人：Fujimi Incorporated

  公开号：EP2957613A1

  公开（公告）日：2015-12-23

  The present invention provides a polishing composition comprising an abrasive, a water-soluble polymer and water. The polishing composition has a volume average particle diameter DA of grains in the polishing composition of 20 nm to 60 nm measured by dynamic light scattering at a concentration equivalent to 0.2 % abrasive content by mass.

  本发明提供了一种由磨料、水溶性聚合物和水组成的抛光组合物。通过动态光散射测量，抛光组合物中颗粒的体积平均粒径 DA 为 20 nm 至 60 nm，浓度相当于 0.2 % 的研磨剂含量（质量百分比）。