Magnetic and transport properties of homogeneous MnxGe1−x ferromagnetic semiconductor with high Mn concentration
作者:Y. X. Chen、Shi-shen Yan、Y. Fang、Y. F. Tian、S. Q. Xiao、G. L. Liu、Y. H. Liu、L. M. Mei
DOI:10.1063/1.2436710
日期:2007.1.29
Homogeneous MnxGe1−x ferromagnetic semiconductor films with high Mn concentration were prepared, contrasting with dilute inhomogeneous MnxGe1−x magnetic semiconductors. The saturation magnetization of Mn0.57Ge0.43 films is high, up to 327emu∕cm3 (1.04μB∕Mn) at 5K, and the Curie temperature is about 213K. The Mn0.57Ge0.43 films show semiconducting resistance, but the magnetoresistance is negligibly
制备了具有高 Mn 浓度的均质 MnxGe1-x 铁磁半导体薄膜,与稀释的非均质 MnxGe1-x 磁性半导体形成对比。Mn0.57Ge0.43薄膜的饱和磁化强度较高,5K时可达327emu∕cm3(1.04μB∕Mn),居里温度约为213K。Mn0.57Ge0.43 薄膜显示出半导体电阻,但磁阻小到可以忽略不计。在居里温度以下观察到异常霍尔效应,这与磁测量结果一致。基于弱局域化的 s,p 空穴载流子与强局域化 Mn 原子的 d 电子之间的 s,pd 交换耦合讨论了全局铁磁性。