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溴硅 | 13465-73-1

中文名称
溴硅
中文别名
——
英文名称
silyl bromide
英文别名
bromosilane
溴硅化学式
CAS
13465-73-1
化学式
BrH3Si
mdl
——
分子量
111.013
InChiKey
VQPFDLRNOCQMSN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    -93.9°C
  • 沸点:
    2.4°C (estimate)
  • 密度:
    1.473 (estimate)

计算性质

  • 辛醇/水分配系数(LogP):
    -0.34
  • 重原子数:
    2
  • 可旋转键数:
    0
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    0
  • 氢给体数:
    0
  • 氢受体数:
    0

安全信息

  • 储存条件:
    库房应保持通风、低温和干燥,并采用密闭方式存放。

制备方法与用途

类别:自燃物品
可燃性危险特性:在空气中自燃;热分解排出有毒溴化物烟雾
储运特性:库房通风低温干燥;密闭存放
灭火剂:泡沫、干粉、二氧化碳、干砂

反应信息

  • 作为反应物:
    描述:
    溴硅 以 gas 为溶剂, 生成 氢化硅
    参考文献:
    名称:
    Direct kinetic studies of SiH3+SiH3, H, CCl4, SiD4, Si2H6, and C3H6by tunable infrared diode laser spectroscopy
    摘要:
    Gas phase reactions of silyl radical, SiH3, are investigated at room temperature using tunable diode laser flash kinetic spectroscopy. Photolytic generation of silyl at 193 and 248 nm is demonstrated using several different precursor systems. The silyl recombination reaction, SiH3+SiH3→Si2H6, is studied by quantitative measurement of SiH3 and attendant product densities. Analysis yields a refinement of the rate constant, krc=(7.9±2.9)×10−11 cm3 molecule−1 s−1. By modeling silyl densities following photolysis of HCl in SiH4, bimolecular rate constants for H+SiH3 and H+SiH4 are determined to be (2±1)×10−11 and (2.5±0.5)×10−13 cm3 molecule−1 s−1, respectively. Reactions of SiH3 with SiD4, Si2H6, CCl4, and C3H6 (propylene) are studied under pseudo-first-order conditions. Derived upper limits to the rate constants show these reactions to be slow at room temperature. The data demonstrate the reactivity of silyl with open-shell (radical) species and the general inertness of silyl toward closed shell molecules. Under typical chemical vapor deposition conditions, SiH3 is, therefore, a kinetically long-lived species in the gas phase and consequently a potentially important film forming species under plasma and photochemical deposition conditions.
    DOI:
    10.1063/1.461707
  • 作为产物:
    描述:
    氢溴酸 生成 溴硅
    参考文献:
    名称:
    IXARA, JOSINAO;KOGAVA, TEHNKO
    摘要:
    DOI:
  • 作为试剂:
    描述:
    丙基溴化镁溴硅 作用下, 生成 正丙基硅烷
    参考文献:
    名称:
    The Preparation of Monobromosilane and Organic Silyl Derivatives
    摘要:
    DOI:
    10.1021/ja01583a012
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文献信息

  • Preparation and chemical and spectroscopic properties of (disilylamino)difluorophosphine and bis(difluorophosphino)silylamine
    作者:E. A. V. Ebsworth、David W. H. Rankin、John G. Wright
    DOI:10.1039/dt9790001065
    日期:——
    N(PF2)2(SiH3) have been prepared by the reactions of SiBrH3 and NMe3 with PF2[NH(SiH3)] and NH(PF2)2 respectively. Vibrational, n.m.r., mass, and photoelectron spectra have been recorded, and chemical properties have been studied. With diborane, PF2[N(SiH3)2] gives the adduct PF2[N(SiH3)2]·BH3 and N(PF2)2(SiH3) gives both mono- and bis-(borane) adducts; n.m.r. spectre of the three borane adducts have
    通过SiBrH 3和NMe 3与PF 2 [NH(SiH 3)]和NH(PF 2)的反应制备了化合物PF 2 [N(SiH 3)2 ]和N(PF 2)2(SiH 3)。)2。记录了振动,核磁共振,质量和光电子能谱,并对化学性质进行了研究。与乙硼烷一起,PF 2 [N(SiH 3)2 ]生成加合物PF 2 [N(SiH 3)2 ]·BH 3和N(PF 2)2(SiH 3)生成单-和双-(硼烷)加合物;记录了三种硼烷加合物的核磁共振谱。在与HBr的反应中,PN键优先受到攻击,而在与水的反应中,Si-N键的裂解首先发生。
  • 13C NMR studies of silyl and germyl complexes of rhodium and iridium containing carbonyl ligands
    作者:E.A.V. Ebsworth、S. Moreton
    DOI:10.1016/0022-328x(92)80231-l
    日期:1992.11
    the type MH4−nXn, in which M  Si, Ge; X = halogen, to complexes of the type M(CO)X(PEt3)2, where M  Rh, Ir; X = halogen had previously been thought frequently to proceed in a trans fashion to give species with hydride trans to silyl or germyl. By using material enriched with 13C in the carbonyl position and studying the couplings between carbonyl and hydride by 13C NMR spectroscopy, we have found, in
    MH 4− n X n类型的简单硅烷和锗烷的氧化加成,其中MSi,Ge; X =卤素,为M(CO)X(PEt 3)2类型的配合物,其中M为Rh,Ir;X =卤素以前被认为经常以反式方式进行,以将具有氢化物的物质反式转化为甲硅烷基或胚芽基。通过使用在羰基位置富含13 C的物质并通过13 C NMR光谱研究羰基与氢化物之间的偶联,我们发现,在所有检查的情况下,氢化物实际上位于甲硅烷基或硅烷基的顺式而不是反式。发现SiH 2 F 2与Ir(CO)Cl(PEt 3)2的反应也是如此,这之前没有进行研究。
  • Reactions of silanes and germanes with iridium complexes. Part 4. Reactions with carbonylhydridotris(triphenylphosphine)iridium(I)
    作者:E. A. V. Ebsworth、Thomas E. Fraser、Steven G. Henderson、Diana M. Leitch、David W. H. Rankin
    DOI:10.1039/dt9810001010
    日期:——
    The title complex, [IrH(CO)(PPh3)3](1), reacts with MH3Q (M = Si or Ge when Q = H, F, Cl, Br, or I; M = Si when Q = SiH3 or CH3) to give [IrH2(CO)(PPh3)2(MH2Q)]. The products have been characterised by 1H, 31P, and (where appropriate)19F n.m.r. spectra. Where M = Ge, the predominant isomer contains mutually trans phosphine ligands, whereas when M = Si the predominant (and in some cases the sole) product
    标题配合物[IrH(CO)(PPh 3)3 ](1)与MH 3 Q反应(当Q = H,F,Cl,Br或I时,M = Si或Ge;当Q = H时,M = Si SiH 3或CH 3)得到[IrH 2(CO)(PPh 3)2(MH 2 Q)]。产品的特征在于1 H,31 P和(在适当情况下)19 F nmr光谱。当M = Ge时,主要的异构体含有相互反式的膦配体,而当M = Si时,主要的产物(在某些情况下是唯一的)含有顺膦。在具有顺式的异构体中膦,在1 H nmr光谱中观察到一些异常的偶联模式。当Q = I和M = Si时,两个SiH质子之间的化学位移相差1.3 ppm,并且在室温下照射一个峰导致另一个峰消失,这种现象被解释为由于饱和转移; 讨论了该过程的可能机制。
  • Reactions of silanes and germanes with iridium complexes. Part 2. Adducts of silyl and germyl halides and related molecules with trans-carbonylhalogenobis(triethylphosphine)iridium(I)
    作者:E. A. V. Ebsworth、Thomas E. Fraser
    DOI:10.1039/dt9790001960
    日期:——
    is always to give trans-[Ir(CO)H(X)(PEt3)2(MH2Q)]; when M = Si the major (and in most cases the only) product has H trans to Si; when M = Ge the major (and in some cases the only) product has H trans to X. When X = Cl and Q = Br or I, the silyl adducts contain Cl bound to Si and Br or I bound to Ir; when M = Ge, however, the adduct initially formed contains Cl bound to Ir and Br or I bound to Ge, although
    复杂的反式-[lr(CO)X(PEt 3)2 ](X = Cl或I)与MH 3 Q(M = Si,Q = H,Cl,Br,I,CH 3或SiH )形成等摩尔加合物3; M = Ge,Q = H,Cl,Br或I)。这些加合物的结构已通过1 H和31 P nmr光谱测定。总是加成反式-[Ir(CO)H(X)(PEt 3)2(MH 2 Q)];当M = Si上主要(在大多数情况下是唯一的)产品的H反式与Si; 当M = Ge时,主要产品(在某些情况下是唯一的产品)具有H反式当X = Cl且Q = Br或I时,甲硅烷基加合物包含与Si结合的Cl和与Ir结合的Br或I。然而,当M = Ge时,尽管最后加成的加合物在室温下在溶液中分解,但最初形成的加合物包含与Ir和Br结合的Cl或与Ge结合的I。
  • Reactions of some simple silanes and germanes with the hydridotrix(trietylphosphine)platinum(II) cation
    作者:E.A.V. Ebsworth、Steven G.D. Henderson、David W.H. Rankin
    DOI:10.1016/s0020-1693(00)90085-9
    日期:1981.1
    eliminating Et3PH+ BPh4+ and forming trans-PtH(PEt3)2(MH2Q), the only product identified when Q = Br and M = Ge or Si. Wiht SiH4 or SiH3Cl, the ony products detected were [Pt(PEt3)3SiH2Q]+. There was no reaction between (I) and GeH4 or SiH3F. None of the products could be isolated; all were characterised by 31P, 1H and (where appropriate) 19F NMR spectroscopy.
    摘要用MH3Q(M = Si或Ge; Q = H,F,Cl,Br或I)处理[PtH(PEt3)3] + BPh4-(I)的溶液,得到的产物取决于M和Q。当M = Ge且Q = F,Cl或I时,通过NMR光谱法可确定6-or化的Pt(II)的三膦阳离子为初始产物。它们在升温时分解,消除了Et3PH + BPh4 +,并形成了反式PtH(PEt3)2(MH2Q),这是当Q = Br和M = Ge或Si时唯一鉴定出的产物。与SiH4或SiH3Cl一起,检测到的产物为[Pt(PEt3)3SiH2Q] +。(I)与GeH 4或SiH 3 F之间没有反应。没有一种产品可以被隔离;所有这些都通过31P,1H和(在适当情况下)19F NMR光谱进行了表征。
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