作者:John E. Marra、Eric R. Kreidler、Nathan S. Jacobson、Dennis S. Fox
DOI:10.1149/1.2096054
日期:1988.6.1
Silicon oxychloride compounds formed during the high temperature reaction of Si and SiC with Cl2/O2 mixtures at 930 and 950 C have been directly observed with an atmospheric pressure mass spectrometer sampling system. Molecules with the formulas Si2OCl6 and Si3OCl8 have been identified. These compounds are very likely formed by a gas phase reaction between the oxygen gas in the system and silicon tetrachloride
在 930 和 950 C 下,Si 和 SiC 与 Cl2/O2 混合物的高温反应过程中形成的氧氯化硅化合物已通过大气压质谱仪采样系统直接观察到。分子式为 Si2OCl6 和 Si3OCl8 的分子已被鉴定。这些化合物很可能是由系统中的氧气与通过氯化硅基材料产生的四氯化硅之间的气相反应形成的。