Tantalum organic precursors and their use for vapor phase deposition of tantalum containing films
申请人:L'AIR LIQUIDE, SOCIETE ANONYME POUR
L'ETUDE ET L'EXPLOITATION DES PROCEDES
GEORGES CLAUDE
公开号:EP2902395A1
公开(公告)日:2015-08-05
Compounds of formula (I): M(R1CS2)R2R3NR6
R1, R2, R3 are organic ligands being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylamine group, alkylsylilamine group.
R6 is an organic ligand being independently selected in H, C1-C4 alkyl group linear or branched, aryl group, silyl group, alkylsylilamine group.
M is tantalum.
化合物的化学式(I):M(R1CS2)R2R3NR6R1,其中R2,R3是有机配体,可以独立地选择为H,C1-C4直链或支链烷基,芳基,硅基,烷基胺基,烷基硅胺基。R6是有机配体,可以独立地选择为H,C1-C4直链或支链烷基,芳基,硅基,烷基硅胺基。M是钽。