Nickel--uranium (2/1) | 12260-60-5

• 分子结构分类: 无机化合物 - 均相金属化合物 - 金属间过渡金属化合物
• 英文名称: Nickel--uranium (2/1)
• 英文别名: nickel;uranium
• CAS: 12260-60-5
• 化学式: Ni₂U
• 分子量: 355.409
• InChiKey: SYOBZFYSZXKNHG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.01
• 重原子数：
  3
• 可旋转键数：
  0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  Nickel--uranium (2/1) 在 air 作用下， 生成
  参考文献：
  名称：

  Partial oxidation of methane over bimetallic copper- and nickel-actinide oxides (Th, U)

  摘要：

  The study of partial oxidation of methane (POM) over bimetallic nickel- or copper-actinide oxides was undertaken. Binary intermetallic compounds of the type AnNi(2) (An = Th, U) and ThCu2 were used as precursors and the products (2NiO UO3, 2NiO ThO2 and 2CuO ThO2) characterized by means of Xray diffraction, X-ray photoelectron spectroscopy, Raman spectroscopy and temperature-programmed reduction. The catalysts were active and selective for the conversion of methane to H-2 and CO and stable for a period of time of approximate to 18 h on stream. The nickel catalysts were more active and selective than the copper catalyst and, under the same conditions, show a catalytic behaviour comparable to that of a platinum commercial catalyst, 5 wt% Pt/Al2O3 The catalytic activity increases when uranium replaces thorium and the selectivity of this type of materials is clearly different from that of single metal oxides and/or mechanical mixtures. The good catalytic behaviour of the bimetallic copper- and nickel-actinide oxides was attributed to an unusual interaction between copper or nickel oxide and the actinide oxide phase as showed by H-2-TPR, XPS and Raman analysis of the catalysts before and after reaction. (C) 2010 Elsevier B V. All rights reserved.

  DOI：

  10.1016/j.jallcom.2010.03.021
• 作为产物：
  描述：

  nickel uranium carbide 以 neat (no solvent) 为溶剂， 生成 nickel;uranium 、 Nickel--uranium (2/1)
  参考文献：
  名称：

  Anselin, F.; Calais, D.; Dean, G., Comptes Rendus Hebdomadaires des Seances de l'Academie des Sciences, 1963, vol. 257, p. 3916 - 3918

  摘要：

  DOI：

文献信息

• Mechanical and thermal properties of uranium intermetallic compounds
  作者：S. Yamanaka、K. Yamada、T. Tsuzuki、T. Iguchi、M. Katsura、Y. Hoshino、W. Saiki

  DOI：10.1016/s0925-8388(98)00152-2

  日期：1998.6

  coefficients of the intermetallic compounds were evaluated from high-temperature X-ray diffraction data. The longitudinal and shear sound velocities of the intermetallic compounds were markedly different, which enabled us to estimate the elastic properties. The intermetallic compounds were found to have higher bulk moduli than uranium metal. The values of microhardness of the intermetallic compounds except UFe

  摘要 研究了UFe 2 、UNi 2 、UPd 3 、URh 3 、URu 3 和UNi 5 的结构和晶格常数，并根据高温X射线衍射数据评估了金属间化合物的热膨胀系数。金属间化合物的纵向和剪切声速明显不同，这使我们能够估计弹性特性。发现金属间化合物具有比铀金属更高的体积模量。除UFe 2 外，金属间化合物的显微硬度值远高于纯铀。根据声速和热膨胀数据估计金属间化合物的物理化学性质，如德拜温度和热容量，并讨论了性质之间的相关性。
• Magnetic properties of U(NixAl1−x)2
  作者：E. Burzo、P. Lucaci

  DOI：10.1016/0038-1098(89)90815-6

  日期：1989.10

  Abstract The results of magnetic measurements performed on U(NixAl1−x)2 alloys in the temperature range 4.2 and 800 K are reported. By gradual replacement of aluminum by nickel up to x

  摘要 报告了在 4.2 和 800 K 温度范围内对 U(NixAl1-x)2 合金进行磁性测量的结果。通过镍逐渐替代铝，最多 x
• Gmelin Handbuch der Anorganischen Chemie, Gmelin Handbook: Ni: MVol.B3, 209, page 1234 - 1236
  作者：

  DOI：——

  日期：——
• Photoelectron spectroscopy study of U–Ni alloys: a comparison of thin films and bulk systems
  作者：L. Black、T. Gouder、F. Wastin、J. Rebizant、L. Havela

  DOI：10.1016/s0039-6028(01)01849-0

  日期：2002.4

  We present a comparative study of UNi2 and UNi5 intermetallic compounds and U-Ni thin films prepared by sputter deposition. The aim of this work was to study the electronic structure of the U-Ni alloys. and in particular to investigate to what extent thin films are representative of the corresponding bulk materials. Electronic structure and surface composition was investigated by X-ray and ultra-violet photoelectron spectroscopics respectively. and X-ray induced Auger electron spectroscopy. The composition of thin films. sputter deposited from a UNi5 target. was strongly dependent on deposition conditions (pressure. target voltage). and ranged from U20Ni80 to U14Ni86. Deposition at room temperature resulted in amorphous films. while deposition at a substrate temperature of 473 K lead to the formation of crystalline phases. In all phases, the U 5f electrons are itinerant and remain pinned at the Fermi-level. With increasing U content. the Ni 3d band shifts towards higher binding energies and becomes narrower than in elemental Ni. (C) 2001 Elsevier Science B.V. All rights reserved.
• Actinide heterobimetallic oxides (Th, U): reduction studies
  作者：Joaquim Branco、Catarina de Jesus Dias、António Pereira Gonçalves、Teresa Almeida Gasche、António Pires de Matos

  DOI：10.1016/j.tca.2003.11.060

  日期：2004.10