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1,1,5-trihydro-2,5-bis(trifluoromethyl)-4-oxo-perfluoro-1-hexene | 475636-73-8

中文名称
——
中文别名
——
英文名称
1,1,5-trihydro-2,5-bis(trifluoromethyl)-4-oxo-perfluoro-1-hexene
英文别名
CH2=C(CF3)CF2OCH(CF3)2
1,1,5-trihydro-2,5-bis(trifluoromethyl)-4-oxo-perfluoro-1-hexene化学式
CAS
475636-73-8
化学式
C7H3F11O
mdl
——
分子量
312.083
InChiKey
MECVJKATYCUGJR-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.21
  • 重原子数:
    19.0
  • 可旋转键数:
    3.0
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.71
  • 拓扑面积:
    9.23
  • 氢给体数:
    0.0
  • 氢受体数:
    1.0

反应信息

  • 作为产物:
    描述:
    六氟异丙醇 、 Sulfurofluoridic acid;3,3,3-trifluoro-2-(trifluoromethyl)prop-1-ene 在 三正丁胺 作用下, 以 二乙二醇二甲醚 为溶剂, 反应 2.0h, 以83%的产率得到1,1,5-trihydro-2,5-bis(trifluoromethyl)-4-oxo-perfluoro-1-hexene
    参考文献:
    名称:
    Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency
    摘要:
    With the advent of 157 nm as the next photolithographic wavelength, there has been a need to find transparent and radiation durable polymers for use as soft pellicles. Pellicles are similar to1 mum thick polymer membranes used in the photolithographic reproduction of semiconductor integrated circuits to prevent dust particles on the surface of the photomask from imaging into the photoresist coated wafer. Practical pellicle films must transmit at least 98% of incident light and have sufficient radiation durability to withstand kilojoules of optical irradiation at the lithographic wavelength. As exposure wavelengths have become shorter the electronics industry has been able to achieve adequate transparency only by moving from nitrocellulose polymers to perfluorinated polymers as, for example, Teflon(R) AF 1600 and Cytop(TM) for use in 193 nm photolithography. Unfortunately, the transparency advantages of perfluorinated polymers fail spectacularly at 157 nm; I Put thick Cytop(TM) have 157 nm transparency of no more than 38 and 2%, respectively, with 157 nm pellicle lifetimes films of Teflon(R) AF 1600 and measured in millijoules.Polymers such as -[(CH2CHF)(x)C(CF3)(2)CH2](y)-, or -(CH2CF2)(x)[2,2-bis(trifluoromethyl)-4,5-difluoro-1,3-dioxole](y)- with chains that alternate fluorocarbon segments with either oxygen or hydrocarbon segments frequently show >98% transparency at 157 nm, if amorphous. These polymers are made from monomers, such as vinylidene fluoride (VF2) and hexafluoroisobutylene, which themselves exhibit good alternation of CH2 and CF2 in their structures. In addition, we find that ether linkages also can serve to force alternation. In addition, we find that fluorocarbon segments shorter than six carbons, and hydrocarbon segments less than two carbons or less than three carbons if partially fluorinated also promote 157 nm transparency. We also find that even with these design principles, it is advantageous to avoid small rings, as arise in the cyclobutanes. These results suggest a steric component to transparency in addition to the importance of alternation.Upon irradiation these polymers undergo photochemical darkening and therefore none has demonstrated the kilojoule radiation durability lifetimes required to be commercially attractive. This is likely because these exposure lifetimes require every bond to absorb similar to10 photons, each photon having an energy roughly twice common bond energies. We have studied intrinsic (composition, molecular weight) and extrinsic (trace metals, impurities, environmental contaminants, oxygen, water) contributions to optical absorption and photochemical darkening in these polymers. Studies of photochemical darkening in model molecules illustrate the dynamics of photochemical darkening and that appreciable lifetimes can be achieved in fluorocarbons. To a first approximation the polymers that have lower 157 nm optical absorbance also tend to show the longest lifetimes. These results imply that quantum yield, or the extent to which the polymer structure can harmlessly dissipate the energy, can be important as well. (C) 2003 Elsevier Science B.V. All rights reserved.
    DOI:
    10.1016/s0022-1139(03)00081-2
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文献信息

  • Fluorosulfates of hexafluoroisobutylene and its higher homologs
    申请人:——
    公开号:US20040019237A1
    公开(公告)日:2004-01-29
    Hexafluoroisobutylene and its higher homologs are easily reacted with SO 3 to give fluorosulfates of the formula CH 2 ═C(R)CF 2 OSO 2 F, wherein R is a linear, branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH 2 ═C(R)CF 2 X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.
    六氟异丁烯及其较高同系物很容易与SO3反应,生成化学式为CH2C(R)CF2OSO2F的氟磺酸,其中R是由1至10个原子组成的线性、支链或环状氟烷基团,可能含有醚。这些化合物在温和条件下与许多亲核试剂反应,生成CH2C(R)CF2X,其中X来源于亲核试剂。这种反应提供了许多取代六氟异丁烯的途径,它们与其他化物和氢化物单体(如偏氟乙烯乙烯)易于共聚。
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