osmocene carboxaldehyde | 200402-71-7

• 英文名称: osmocene carboxaldehyde
• CAS: 200402-71-7
• 化学式: C₁₁H₁₀OOs
• 分子量: 348.4
• InChiKey: MHTYEFIGBDTNDD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  None
• 重原子数：
  None
• 可旋转键数：
  None
• 环数：
  None
• sp3杂化的碳原子比例：
  None
• 拓扑面积：
  None
• 氢给体数：
  None
• 氢受体数：
  None

反应信息

• 作为反应物：
  描述：

  osmocene carboxaldehyde 、 2,3-双(羟基氨基)-2,3-二甲基丁烷硫酸盐 在 t-BuOK 、 PbO₂ 作用下， 以 甲醇 为溶剂， 以32%的产率得到4,4,5,5-tetramethyl-3-oxide-2-osmeocenyl-imidazoline-1-oxyl
  参考文献：
  名称：

  通过有机金属偶联剂的电磁相互作用的传输：茂金属取代的新系列的α-亚硝酰基氨氧基自由基。

  摘要：

  通过研究双自由基2族（M = Fe，Ru），评估了茂金属桥作为新型有机金属磁耦合剂的能力，该双自由基2由通过1，1'-间茂金属桥连接的两个纯有机α-亚硝基氨甲基自由基组成。以2-金属茂基-α-亚硝酰基氨基单自由基1（M = Fe，Ru，Os）作为参比化合物进行的初步研究表明，茂金属的中心金属上存在较小的自旋密度。这一事实使茂金属单元成为有效的桥，以通过自旋极化机制传输磁相互作用。对固态和稀释冷冻溶液中双自由基2的磁性的研究表明，自由基亚基之间存在分子内反铁磁交换相互作用，其强度高度依赖于双自由基所采用的分子构象。如晶体数据和ESR测量所示，两个自由基单元之间的分子内氢键迫使分子采取顺式分子构象，从而确定了磁性相互作用是由两个SOMO之间的直接空间相互作用引起的。自由基单元以及通过茂金属单元的sigma键的经典自旋极化机制。两种结构的晶格常数如下：1（M = Fe），C（17）H（21）FeN（2）O（2），a

  DOI：

  10.1021/ic980495h
• 作为产物：
  描述：

  osmocene 、 N-甲基乙酰苯胺 在 三氯氧磷 、 sodium acetate 作用下， 以 甲苯 、 水 为溶剂， 反应 27.0h， 以79%的产率得到osmocene carboxaldehyde
  参考文献：
  名称：

  Nano islet formation of formyl- and carboxyferrocene, -ruthenocene, -osmocene and cobaltocenium on amine-functionalized silicon wafers highlighted by crystallographic, AFM and XPS studies

  摘要：

  Surface-hydroxylated silicon wafers, 8, were reacted with 3-aminopropyltrimethoxysilane, 9, to create wafers with amine-functionalized surfaces, 10. The metallocenylaldehydes FcCHO, 1 (Fc = ferrocenyl = Fe-II(C5H5)(C5H4)), RcCHO, 2 (Rc = ruthenocenyl Ru-II(C5H5)(C5H4)), and OcCHO, 3 (Oc = osmocenyl = Os-II(C5H5)(C5H4)) as well as the carboxylic acids FcCOOH, 4, RcCOOH, 5, OcCOOH, 6, and Cc(+)COOH center dot PF6-, 7 (Cc(+) = cationic cobaltocenium = [Co-III(C5H5)(C5H4)](+)), were reacted with 10 to covalently anchor the metallocenes on the wafers either via an imine (-CH=N-) or amide (-NHCO-) bond. The aldehydes were anchored more effectively than the carboxylic acids. Binding energies of all important atoms in all seven systems were determined by XPS measurements. Metal binding energies of the amide-bonded metallocenes were consistently larger (up to 0.6 eV) than those of the imine-anchored systems. AFM and SEM measurements showed that the covalently anchored metallocenes aggregate into nano-islets of diameter between 40 and 100 nm depending on the metallocene and type of anchoring bond. Up to seven additional layers of unreacted metallocenylaldehyde or -acid further stacked on top of the main layer of metallocene to form each islet. These additional layers of metallocene of each islet are stabilized by a large network of secondary and/or tertiary bonding forces. The main film surfaces have average thicknesses ranging between 2 and 6 nm, while film roughness, which is mostly associated with the islets, was with one exception (that of the Oc-CONH- surface 14) between 17% and 68% of the film thickness. The crystal structures for OcCHO, 3, and Cc(+)COOH center dot PF6-, 7, was determined and the observed tertiary and secondary intermolecular interactions between independent molecules explains the formation of the nano-islets of each metallocene when anchored onto the aminated silicon wafers. (C) 2013 Elsevier B. V. All rights reserved.

  DOI：

  10.1016/j.jorganchem.2013.08.026