silicon tetrafluoride, Si-28 | 62566-70-5

• 英文名称: silicon tetrafluoride, Si-28
• 英文别名: silicon tetrafluoride
• CAS: 62566-70-5
• 化学式: F₄Si
• 分子量: 103.994
• InChiKey: ABTOQLMXBSRXSM-YXLLSUOZSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  5.0
• 可旋转键数：
  0.0
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0.0
• 氢给体数：
  0.0
• 氢受体数：
  0.0

反应信息

• 作为反应物：
  描述：

  silicon tetrafluoride, Si-28 以 neat (no solvent) 为溶剂， 生成 硅烷
  参考文献：
  名称：

  Sennikov, P. G.; Vodopyanov, A. V.; Golubev, S. V., Solid State Communications, 2012, vol. 152, p. 455 - 457

  摘要：

  DOI：

文献信息

• Formation of impurity Si2OH6 in silane synthesized from silicon tetrafluoride
  作者：A. D. Bulanov、P. G. Sennikov、A. Yu. Sozin、A. Yu. Lashkov、O. Yu. Troshin

  DOI：10.1134/s0036023611040061

  日期：2011.4

  The possibility of the reduction of hexafluorodisiloxane by calcium hydride in the synthesis of silane from silicon tetrafluoride has been studied. This reaction is shown to be not decisive for oxygen contamination of silane. The most likely reason for the appearance of impurity Si2OH6 in "fluoride" silane is the Ca(OH)(2)-catalyzed reaction of silane with trace water. The concentration of impurity Si2OH6 in silane at the stage of synthesis may be efficiently decreased by the preliminary purging of calcium hydride with a hydrogen (grade A) flow.
• ——
  作者：A. D. Bulanov、V. V. Balabanov、D. A. Pryakhin、O. Yu. Troshin

  DOI：10.1023/a:1014735203351

  日期：——

  Silicon tetrafluoride was obtained by the thermal decomposition of pure-grade sodium hexafluorosilicate and purified by low-temperature distillation. Next, SiF4 was Si-28-enriched by centrifugation and converted to silane by calcium hydride reduction. To remove hydrocarbons, the silane was distilled.
• Impurities in monosilanes synthesized by different processes
  作者：P. G. Sennikov、A. P. Kotkov、S. A. Adamchik、N. D. Grishnova、L. A. Chuprov、S. A. Ignatov

  DOI：10.1134/s0020168510040072

  日期：2010.4

  Using high-resolution IR spectroscopy, we have compared the impurity compositions of monosilane (SiH(4)) fractions enriched in impurities in the process of cryofiltration and low-temperature distillation of monosilanes derived from silicon tetrafluoride (SiF(4)) and trichlorosilane (SiCl(3)H). The results demonstrate that the more volatile impurities present in both monosilanes are methane (CH(4)) and carbon dioxide (CO(2)), whereas the impurities specific to the fluoride-derived monosilane are SiF(4), SiF(3)H, and SiF(2)H(2). The less volatile impurities common to both monosilanes are ethane (C(2)H(6)), disiloxane (Si(2)H(6)O), and disilane (Si(2)H(6)); the impurities specific to the fluoride-derived monosilane are tetrafluoroethylene (C(2)F(4)) and monofluorosilane (SiFH(3)); and those specific to the chloride-derived monosilane are hydrogen chloride (HCl) and the chlorosilanes SiClH(3), SiCl(2)H(2), and SiCl(3)H.