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| 906340-19-0

中文名称
——
中文别名
——
英文名称
——
英文别名
——
化学式
CAS
906340-19-0
化学式
C15H28FeO2Si4
mdl
——
分子量
408.575
InChiKey
BWCQASTWINVACT-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    None
  • 重原子数:
    None
  • 可旋转键数:
    None
  • 环数:
    None
  • sp3杂化的碳原子比例:
    None
  • 拓扑面积:
    None
  • 氢给体数:
    None
  • 氢受体数:
    None

反应信息

  • 作为反应物:
    描述:
    氘代苯 为溶剂, 以22%的产率得到
    参考文献:
    名称:
    Photochemical Ring-Contraction of a Tetrasilaferracyclohexane of the (η5-C5H4)Fe(CO)2 System to Trisilaferracyclopentanes
    摘要:
    Treatment of (eta(5)-C5H5)Fe(CO)(2)(SiMe2)(n)Cl (n = 3, 4) with lithium diisopropylamide leads directly to new trisila- (1) and tetrasilaferracycles (2) [(eta 5-C5H4)Fe(CO)(2)(SiMe2)(n)]. The trisilaferracycle (1) exhibits a degree of ring strain as noted by Si-29 NMR spectroscopy and single-crystal X-ray analysis but is stable with respect to limited attempts at ring-opening polymerization and photochemical transformation. In contrast, 2, with no ring strain, readily transforms via photochemical irradiation by way of iron silyl(silylenes) to a trimethylsilyl-substituted trisilaferracycle 4, which in turn transforms to 1 upon prolonged irradiation.
    DOI:
    10.1021/om060320c
  • 作为产物:
    描述:
    FpSiMe2SiMe2SiMe2SiMe2Cl 在 LiN(CH(CH3)2)2 作用下, 以 四氢呋喃 为溶剂, 以24%的产率得到
    参考文献:
    名称:
    Photochemical Ring-Contraction of a Tetrasilaferracyclohexane of the (η5-C5H4)Fe(CO)2 System to Trisilaferracyclopentanes
    摘要:
    Treatment of (eta(5)-C5H5)Fe(CO)(2)(SiMe2)(n)Cl (n = 3, 4) with lithium diisopropylamide leads directly to new trisila- (1) and tetrasilaferracycles (2) [(eta 5-C5H4)Fe(CO)(2)(SiMe2)(n)]. The trisilaferracycle (1) exhibits a degree of ring strain as noted by Si-29 NMR spectroscopy and single-crystal X-ray analysis but is stable with respect to limited attempts at ring-opening polymerization and photochemical transformation. In contrast, 2, with no ring strain, readily transforms via photochemical irradiation by way of iron silyl(silylenes) to a trimethylsilyl-substituted trisilaferracycle 4, which in turn transforms to 1 upon prolonged irradiation.
    DOI:
    10.1021/om060320c
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