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(2,5-norbornadiene)Pt(CD3)2 | 240123-30-2

中文名称
——
中文别名
——
英文名称
(2,5-norbornadiene)Pt(CD3)2
英文别名
——
(2,5-norbornadiene)Pt(CD3)2化学式
CAS
240123-30-2
化学式
C9H14Pt
mdl
——
分子量
323.243
InChiKey
UXALLEQJZWHTPQ-VJPXTNEWSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    None
  • 重原子数:
    None
  • 可旋转键数:
    None
  • 环数:
    None
  • sp3杂化的碳原子比例:
    None
  • 拓扑面积:
    None
  • 氢给体数:
    None
  • 氢受体数:
    None

反应信息

  • 作为反应物:
    描述:
    (2,5-norbornadiene)Pt(CD3)2N,N-dimethyl-2-diphenylphosphinoethylamine 以85%的产率得到[(κ(2)-P,N)-Me2NCH2CH2PPh2]Pt(CD3)2
    参考文献:
    名称:
    Transition Metal Silyl Complexes. 60.,1 Enhanced Reactivity of a Platinum Dimethyl Complex toward Trimethoxysilane Due to a P,N-Chelating Co Ligand
    摘要:
    [(kappa(2)-P,N)-Me2NCH2CH2PPh2]PtMe2 reacts with trimethoxysilane to yield the methyl trimethoxysilyl complex [(kappa(2)-P,N)-Me2NCH2CH2PPh2]Pt[Si(OMe)(3)]Me, the bis(trimethoxysilyl) complex [(kappa(2)-P,N)-Me2NCH2CH2PPh2]Pt[Si(OMe)(3)](2), methyltrimethoxysilane, tetramethoxysilane, and small amounts of pentamethoxydisiloxane and hexamethoxydisiloxane. The formation of these compounds can be explained by Si-H oxidative addition/reductive elimination, as well as Si-O activation and scrambling reactions of the silicon substituents.
    DOI:
    10.1021/om990123w
  • 作为产物:
    描述:
    二氯(去菠二烯)铂(II)(Methyl-d3)magnesium iodide乙醚 为溶剂, 以89%的产率得到(2,5-norbornadiene)Pt(CD3)2
    参考文献:
    名称:
    Transition Metal Silyl Complexes. 60.,1 Enhanced Reactivity of a Platinum Dimethyl Complex toward Trimethoxysilane Due to a P,N-Chelating Co Ligand
    摘要:
    [(kappa(2)-P,N)-Me2NCH2CH2PPh2]PtMe2 reacts with trimethoxysilane to yield the methyl trimethoxysilyl complex [(kappa(2)-P,N)-Me2NCH2CH2PPh2]Pt[Si(OMe)(3)]Me, the bis(trimethoxysilyl) complex [(kappa(2)-P,N)-Me2NCH2CH2PPh2]Pt[Si(OMe)(3)](2), methyltrimethoxysilane, tetramethoxysilane, and small amounts of pentamethoxydisiloxane and hexamethoxydisiloxane. The formation of these compounds can be explained by Si-H oxidative addition/reductive elimination, as well as Si-O activation and scrambling reactions of the silicon substituents.
    DOI:
    10.1021/om990123w
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