Energy dependencies of fast reactions of positive ions X+ with HCl from near thermal to ≂2 eV center‐of‐mass collision energy (X+=H+,H2+,H3+,N+,N2+,Ar+,C+,CH+, CH2+,CH3+,CH4+,CH5+)
摘要:
The rate coefficients for the reactions of the ions H+, H2+, H3+, N+, N2+, Ar+, C+, CH+, CH2+, CH3+, CH4+, and CH5+ with HCl have been measured as a function of reactant ion/reactant neutral average center-of-mass kinetic energy (KEc.m.). The measurements were performed using a selected ion flow drift tube operated at 300 K with helium buffer gas. Most of these reactions have rate coefficients close to their collisional values at ambient temperature and all of them exhibit a pronounced KEc.m. dependence. A simple model is proposed, in which the measured dependence of the rate coefficients on KEc.m. is expressed in terms of the kinetic-energy dependence of the rate unimolecular decomposition of the intermediate complex formed in the ion-neutral collision.
The rate coefficients and product ion distributions have been obtained for the reactions of the CH+n ions (n = 0 to 4) with COS, H2S, H2CO, CH3OH and CH3NH2 in a SIFT at 300K. The reactions are generally fast binary with multiple products except for CH+3 for which fast ternary association channels are also observed in parallel with the binary channels.
Reactions of He<sup>+</sup>, Ne<sup>+</sup>, and Ar<sup>+</sup> with CH<sub>4</sub>, C<sub>2</sub>H<sub>6</sub>, SiH<sub>4</sub>, and Si<sub>2</sub>H<sub>6</sub>
作者:H. Chatham、D. Hils、R. Robertson、A. C. Gallagher
DOI:10.1063/1.445884
日期:1983.8
The rate coefficients and product-ion distributions for the reactions of He+ and Ar+ with silane and disilane have been measured in a drift tube, typically for collision energies of 0.01–1 eV. The total charge-exchange rate coefficients are found to be roughly independent of E/N, or collision energy, and are about equal to the Langevin values for the reactions of He+ with SiH4 and C2H6 and Ar+ with CH4 and C2H6. The He+ rate coefficients on CH4 and Si2H6, and the Ne+ rate coefficients on SiH4 and Si2H6 are 50% to 80% of the Langevin values, while the Ar+ rate coefficients on SiH4 and Si2H6 are much smaller. Product ions tend to be hydrogen poor with very infrequent breaking of the C–C or Si–Si bonds. Furthermore, hydrogen stripping is more severe for the silanes than the alkanes. These product-ion distributions bear no resemblance to the product-ion distributions of either photoionization or electron collisional ionization.