pentachloro(cyclohexylphosphine)niobium(V) | 244792-47-0

• 英文名称: pentachloro(cyclohexylphosphine)niobium(V)
• CAS: 244792-47-0
• 化学式: C₆H₁₃Cl₅NbP
• 分子量: 386.314
• InChiKey: GHUOACSISHPJCU-UHFFFAOYSA-I

计算性质

• 辛醇/水分配系数(LogP)：
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• 重原子数：
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• 可旋转键数：
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• 环数：
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• sp3杂化的碳原子比例：
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• 拓扑面积：
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• 氢给体数：
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• 氢受体数：
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反应信息

• 作为反应物：
  描述：

  pentachloro(cyclohexylphosphine)niobium(V) 、 环已基膦 以 二氯甲烷 为溶剂， 以66%的产率得到octachlorotetrakis(cyclohexylphosphine)diniobium(IV)
  参考文献：
  名称：

  Synthesis, Structure, and Chemical Vapor Deposition Studies of Molecular Precursors to NbP Films

  摘要：

  Treatment of niobium pentachloride with cyclohexylphosphine and phenylphosphine in dichloromethane afforded octachlorotetrakis(cyclohexylphosphine)diniobium(IV) (85%) and octachlorotetrakis(phenylphosphine)diniobium-(IV) (88%), respectively, as brown-red and dark red crystalline solids. In addition, the phosphonium compound [P(C6H11)H-3](2)[NbCl6] was isolated in 68% yield from the same preparation of octachlorotetrakis(cyclohexylphosphine)diniobium(TV). Studies are described which demonstrate that the primary phosphine serves as the hydrogen atom source for the formation of the phosphonium salts. Octachlorotetrakis(cyclohexylphosphine)diniobium(IV) can be prepared in 77% yield by addition of cyclohexylphosphine to NbCl4(THF)(2) in toluene. The X-ray crystal structure determinations for two dimeric niobium(IV) complexes are described. Octachlorotetrakis(cyclohexylphosphine)diniobium(IV) crystallizes in the triclinic space group P (1) over bar with a = 9.904(2) Angstrom, b = 10.243 (2) Angstrom, c = 10.642(1) Angstrom, alpha = 76.33(2)degrees, beta = 67.231(8)degrees, gamma = 73.76(2)degrees, V = 945.7(3) Angstrom(3) and Z = 1. Octachlorotetrakis(phenylphosphine)diniobium(IV) crystallizes in the orthorhombic space group Pbca with a = 8.873(2) Angstrom, b = 17.394(6) Angstrom, c = 21.778(3) Angstrom, V = 3361.1(9) Angstrom(3), and Z = 4. Octachlorotetrakis(cyclohexylphosphine)diniobium(IV) and octachlorotetrakis(phenylphosphine)diniobium(IV) were evaluated as molecular precursors to niobium(III) phosphide (NbP) films in a chemical vapor deposition reactor Octachlorotetrakis(phenylphosphine)diniobium(Iv) was not volatile and was therefore not a useful precursor. However, octachlorotetrakis(cyclohexylphosphine)diniobium(IV) afforded specular, silver-colored films of NbP with substrate temperatures between 400 and 600 degrees C. The analysis of the films is presented.

  DOI：

  10.1021/ic990198s