| 1245705-21-8

• CAS: 1245705-21-8
• 化学式: C₁₉H₅₀Cl₂HfN₄Si₄
• 分子量: 696.371
• InChiKey: HNGDJECIOIRYQD-UHFFFAOYSA-L

计算性质

• 辛醇/水分配系数(LogP)：
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• 重原子数：
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• 可旋转键数：
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• 环数：
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• sp3杂化的碳原子比例：
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• 拓扑面积：
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• 氢给体数：
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• 氢受体数：
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反应信息

• 作为产物：
  描述：

  二(三甲基硅烷基)酰胺基铪(IV)氯化物 、 N,N'-二异丙基碳二亚胺 以 甲苯 为溶剂， 以82%的产率得到
  参考文献：
  名称：

  Syntheses and structures of novel hafnium chloroamido mono-amidinate and mono-guanidinate as precursors for HfO2 thin film

  摘要：

  The reactions between HfCl2[N(SiMe3)(2)](2) and one or two equivalents of [(PrNC)-Pr-i(Me)(NPr)-Pr-i]Li and Pr-i-N=C=N-Pr-i, at room temperature in toluene, gave the novel chloroamido-amidinato-hafnium HfCl[N(SiMe3)(2)](2)[(PrNC)-Pr-i(Me)(NPr)-Pr-i] (1) and chloroamido-guanidinato-hafnium HfCl2[N(SiMe3)(2)][(PrNC)-Pr-i(N (SiMe3)(2))N(i)Prl (2) compounds, respectively. Compounds 1 and 2 were characterized by NMR and X-ray single crystal diffraction analysis. Their reaction towards alcohol was studied in order to check the dependency between molecular structure and HfO2 Atomic Layer Deposition (ALD) specifications. (C) 2010 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.poly.2010.05.023