HfAl2(μ-isopropoxide)2(μ,η(2)-N,N-dimethylaminoethoxide)2(isopropoxide)6 | 877763-72-9

• 英文名称: HfAl2(μ-isopropoxide)2(μ,η(2)-N,N-dimethylaminoethoxide)2(isopropoxide)6
• CAS: 877763-72-9
• 化学式: C₃₂H₇₆Al₂HfN₂O₁₀
• 分子量: 881.416
• InChiKey: ZAXXGEOAMGXSPE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
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• 重原子数：
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• 可旋转键数：
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• 环数：
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• sp3杂化的碳原子比例：
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• 拓扑面积：
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• 氢给体数：
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• 氢受体数：
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反应信息

• 作为产物：
  描述：

  N,N-二甲基乙醇胺 、 以 甲苯 为溶剂， 以77%的产率得到HfAl2(μ-isopropoxide)2(μ,η(2)-N,N-dimethylaminoethoxide)2(isopropoxide)6
  参考文献：
  名称：

  Synthesis and characterization of Hf–Al heterometallic aminoalkoxides as single-source MOCVD precursors for hafnium aluminate films

  摘要：

  Alcohol exchange reactions applied to HfAl2(OPri)(10) (1) afforded heterometallic Hf-Al aminoalkoxides namely HfAl2(OPri)(8)-(dmae)(2) (dmae = N,N-dimethylaminoethoxide) (2) and HfAl2(OPri)(8)(dmap)(2) (dmap = dimethylaminopropoxide) (3). They were characterized by elemental analysis, FT-IR, H-1 NMR, mass spectrometry and TGA. The molecular structure of 2, as established by single-crystal X-ray diffraction, HfAl2(mu-OPri)(2)(mu,eta(2)-OC2H4NMe2)(2)(OPri)(6), is based on an open-shell trinuclear unit with a central 6-coordinate Hf atom and 5-coordinate Al centres. Compound 2 was tested as a single-source precursor for the deposition of hafnium aluminate films by liquid-injection MOCVD. The films growth rate, composition and morphology were studied in relation with the deposition temperature. The as-deposited at 500-800 degrees C films (both on sapphire and silicon) were amorphous; partial crystallization occurred after 1 h annealing at 900 degrees C. The bulk of the films was Al-rich (Al/Hf = 1.2-1.6) and contained small amounts of carbon (2-4%) and nitrogen (4-5%). (c) 2005 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.poly.2005.06.037