1,4-Anhydro-D-talitol | 887228-41-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧唑烯
• 英文名称: 1,4-Anhydro-D-talitol
• 英文别名: (2R,3S,4S)-2-[(1S)-1,2-dihydroxyethyl]oxolane-3,4-diol
• CAS: 887228-41-3
• 化学式: C₆H₁₂O₅
• 分子量: 164.158
• InChiKey: JNYAEWCLZODPBN-OMMKOOBNSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -2.1
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  90.2
• 氢给体数：
  4
• 氢受体数：
  5

文献信息

• POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST
  申请人：DAICEL CHEMICAL INDUSTRIES, LTD.

  公开号：EP1584634A1

  公开（公告）日：2005-10-12

  A polymeric compound for photoresist of the present invention includes a monomer unit having 2, 6-dioxabicyclo [3.3.0] octane skeleton in the structure. The monomer unit having 2,6-dioxabicyclo[3.3.0]octane skeleton includes a monomer unit represented by the following Formula (I) : wherein R is a hydrogen atom or a methyl group. The polymeric compound for photoresist may include a monomer unit having 2, 6-dioxabicyclo [3.3.0] octane skeleton, a monomer unit having a group of adhesion to substrate, and a monomer unit having an acid-eliminating group. The polymeric compound for photoresist of the present invention exhibits not only adhesion to substrate, acid-eliminating property and resistance to dry-etching but also has well-balanced solubility in solvents for photoresist and alkali-soluble property.

  本发明的光刻胶用聚合化合物包括结构中具有 2，6-二氧杂环[3.3.0]辛烷骨架的单体单元。具有 2，6-二氧杂环[3.3.0]辛烷骨架的单体单元包括下式（I）所代表的单体单元： 其中 R 是氢原子或甲基。光刻胶用高分子化合物可包括具有 2，6-二氧杂环[3.3.0]辛烷骨架的单体单元、具有与基材粘合基团的单体单元和具有酸消除基团的单体单元。本发明的光刻胶用高分子化合物不仅具有对基底的粘附性、酸消除性和抗干蚀性，而且在光刻胶用溶剂中的溶解性和碱溶性也非常均衡。
• NEW SYNTHESIS OF FUCOSE
  申请人：GLYCOM A/S

  公开号：US20140235840A1

  公开（公告）日：2014-08-21

  A process for converting D-glucose into L-fucose, where a first aspect of the disclosure relates to a method of making a compound of formula (1) wherein R is independently H, alkyl or phenyl or, preferably, wherein the two germinal R groups together with the carbon atom to which they are attached form a C3-s cycloalkylidene group, including the step of treating a compound of formula (2) wherein R is defined above and R 1 is a sulphonate leaving group, with a reducing complex metal hydride and, preferably, a base to form the compound of formula (1); a compound of formula (13).