SUBSTITUTED TETRAHYDROISOQUINOLINES USED IN THE FORM OF MMP INHIBITORS, METHOD FOR THE PRODUCTION AND USE THEREOF IN THE FORM OF DRUGS
申请人:Hofmeister Armin
公开号:US20070203118A1
公开(公告)日:2007-08-30
The present invention is directed to a compound of formula (I)
wherein R
1
, R
2
, R
3
, R
4
, A, L and n are as defined herein, or a pharmacologically acceptable salt thereof, its pharmaceutical composition and it use as a MMP inhibitor.
HYDROXAMIC ACID DERIVATIVE AND MMP INHIBITOR CONTAINING THE SAME AS ACTIVE INGREDIENT
申请人:Sumitomo Pharmaceuticals Company, Limited
公开号:EP1466899A1
公开(公告)日:2004-10-13
A hydroxamic acid derivative represented by the following general formula (1) having selective MMP inhibitory activity,
, wherein R1 andR2 each represents hydrogen atom, lower alkyl group, lower haloalkyl etc., X represents methylene group or NR3 (R3 represents hydrogen atom, lower alkyl group, etc.), and R4 represents C1∼4 lower alkyl group.
Hydroxamic acid derivative and mmp inhibitor containing the same as active ingredient
申请人:Horiuchi Yoshihiro
公开号:US20050282905A1
公开(公告)日:2005-12-22
A hydroxamic acid derivative represented by the following general formula (1) having selective MMP inhibitory activity,
,wherein R
1
and R
2
each represents hydrogen atom, lower alkyl group, lower haloalkyl etc., X represents methylene group or NR
3
(R
3
represents hydrogen atom, lower alkyl group, etc.), and R
4
represents C1˜4 lower alkyl group.
由以下通式(1)代表的具有选择性 MMP 抑制活性的羟肟酸衍生物、
其中 R
1
和 R
2
分别代表氢原子、低级烷基、低级卤代烷基等,X 代表亚甲基或 NR
3
(R
3
代表氢原子、低级烷基等),以及 R
4
代表 C1˜4 低级烷基。
LIVING RADICAL POLYPMERIZATION OF ACTIVATED AND NONACTIVATED MONOMERS CONTAINING ELECTRON-WITHDRAWING SIDE GROUPS
申请人:Percec Virgil
公开号:US20100331493A1
公开(公告)日:2010-12-30
The invention concerns a method of polymerizing an alkene monomer to produce a polymer using a catalyst that is Cu(O), Cu
2
Te, CuSe, Cu
2
S, Cu
2
O, or a combination thereof, an initiator, and a component comprising a solvent and optional nitrogen-containing ligand, where the combination of the component and monomer is capable of diproportionating Cu(I)X into Cu(O) and Cu(II)X
2
where X is Cl, Br, or I.