Deprotonative Silylation of Aromatic C–H Bonds Mediated by a Combination of Trifluoromethyltrialkylsilane and Fluoride
作者:Kanako Nozawa-Kumada、Sayuri Osawa、Midori Sasaki、Isabelle Chataigner、Masanori Shigeno、Yoshinori Kondo
DOI:10.1021/acs.joc.7b01525
日期:2017.9.15
method for the deprotonative silylation of aromatic C–H bonds has been developed using trifluoromethyltrimethylsilane (CF3SiMe3, Ruppert–Prakash reagent) and a catalytic amount of fluoride. In this reaction, CF3SiMe3 is considered to act as a base and a silicon electrophile. This process is highly tolerant to various functional groups on heteroarenes and benzenes. Furthermore, this method can be applied
已经开发了一种使用三氟甲基三甲基硅烷(CF 3 SiMe 3,Ruppert-Prakash试剂)和催化量氟化物的芳香族C-H键去质子化甲硅烷基化的方法。在该反应中,认为CF 3 SiMe 3用作碱和亲电子硅。该过程高度耐受杂芳烃和苯上的各种官能团。此外,该方法可以应用于TAC-101的含三甲基甲硅烷基的类似物的合成,TAC-101是对视黄酸受体α(RAR-α)结合具有选择性亲和力的生物活性合成类视黄醇。我们还报告了甲硅烷基化产物进一步转变为有用的衍生物的过程。