申请人:Thurston David Edwin
公开号:US06909006B1
公开(公告)日:2005-06-21
Compounds of formula (III) or (V), wherein is a solid support; L is a linking group or a single bond; T is a combinatorial unit; n is a positive integer, where if n is greater than 1, each T may be different: X is an electrophilic leaving group; Y is selected from NH-Prot, O-Prot, S-Prot, NO
2
, —NHOH. N
3
, NHR, NRR, N═NR, N(O)RR, NHSO
2
R, N═N═PhR, SR or SSR, where Prot represents a protecting group; A and B collectively represent a fused benzene or pyrrole ring (in either orientation), which is optionally substituted by up to respectively 4 or 2 groups independently selected from R, OH, OR, halo, nitro, amino, Me
3
Sn, CO
2
H, CO
2
R, R
1
is a nitrogen protecting group, where if Y includes a protecting group, these protecting groups are orthogonal and R
2
and R
7
are independently selected from H, R, OH, OR, halo, nitro, amino, Me
3
Sn, and other related compounds and collections of compounds.
式(III)或(V)的化合物中,其中是固体支撑;L是连接基团或单键;T是组合单元;n是正整数,如果n大于1,则每个T可能不同:X是亲电离开基团;Y从NH-Prot、O-Prot、S-Prot、NO2、—NHOH、N3、NHR、NRR、N═NR、N(O)RR、NHSO2R、N═N═PhR、SR或SSR中选择,其中Prot代表保护基团;A和B共同代表一个融合的苯或吡咯环(在任何方向),可选地由最多分别从R、OH、OR、卤、硝基、氨基、Me3Sn、CO2H、CO2R中独立选择的4个或2个基团取代,R1是氮保护基团,如果Y包括保护基团,则这些保护基团是正交的,R2和R7分别独立选择自H、R、OH、OR、卤、硝基、氨基、Me3Sn和其他相关化合物和化合物集合。